journal article·2017-04

Investigation of interface property in Al/SiO2/n-SiC structure with thin gate oxide by illumination

P. K. Chang, J. G. Hwu

Applied Physics A· Volume 123· Issue 4
Publisher page

Abstract

The reverse tunneling current of Al/SiO2/n-SiC structure employing thin gate oxide is introduced to examine the interface property by illumination. The gate current at negative bias decreases under blue LED illumination, yet increases under UV lamp illumination. Light-induced electrons captured by interface states may be emitted after the light sources are off, leading to the recovery of gate currents. Based on transient characteristics of gate current, the extracted trap level is close to the light energy for blue LED, indicating that electron capture induced by lighting may result in the reduction of gate current. Furthermore, bidirectional C–V measurements exhibit a positive voltage shift caused by electron trapping under blue LED illumination, while a negative voltage shift is observed under UV lamp illumination. Distinct trapping and detrapping behaviors can be observed from variations in I–V and C–V curves utilizing different light sources for 4H-SiC MOS capacitors with thin insulators.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Silicon Carbide Semiconductor Technologies · Semiconductor materials and devices · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (34)

Show source-provided references
1. C.I. Harris, V.V. Afanas’ev, Microelectron. Eng 36, 167 (1997)10.1016/S0167-9317(97)00041-5 ↗
2. I. Vickridge, J. Ganem, Y. Hoshino, I. Trimaille, J. Phys. D: Appl. Phys 40, 6254 (2007)10.1088/0022-3727/40/20/S10 ↗
3. R.H. Kikuchi, K. Kita, Appl. Phys. Lett. 104, 052106 (2014)10.1063/1.4864284 ↗
4. E. Arnold, D. Alok, IEEE Trans. Electron Device 48, 1870 (2001)10.1109/16.944171 ↗
5. H. Yoshioka, J. Senzaki, A. Shimozato, Y. Tanaka, H. Okumura, Appl. Phys. Lett. 104, 083516 (2014)10.1063/1.4866790 ↗
6. G.Y. Chung, C.C. Tin, J.R. Williams, K. McDonald, R.K. Chanana, R.A. Weller, S.T. Pantelides, L.C. Feldman, O.W. Holland, M.K. Das, J.W. Palmour, IEEE Electron Device Lett. 22, 176 (2001)10.1109/55.915604 ↗
7. Y. Nanen, M. Kato, J. Suda, T. Kimoto, IEEE Trans. Electron Device 60, 1260 (2013)10.1109/TED.2012.2236333 ↗
8. D. Okamoto, H. Yano, K. Hirata, T. Hatayama, T. Fuyuki, IEEE Electron Device Lett. 31, 710 (2010)10.1109/LED.2010.2047239 ↗
9. P. Fiorenza, F. Giannazzo, M. Vivona, A.L. Magna, F. Roccaforte, Appl. Phys. Lett. 103, 153508 (2013)10.1063/1.4824980 ↗
10. A. Poggi, F. Moscatelli, Y. Hijikata, S. Solmi, R. Nipoti, Microelectron. Eng. 84, 2804 (2007)10.1016/j.mee.2007.01.241 ↗
11. R. Esteve, A. Schöner, S.A. Reshanov, C.M. Zetterling, H. Nagasawa, J. Appl. Phys. 106, 044514 (2009)10.1063/1.3204646 ↗
12. F. Allerstam, H.Ö. Ólafsson, G. Gudjónsson, D. Dochev, E.Ö. Sveinbjörnsson, T. Rödle, R. Jos, J. Appl. Phys 101, 124502 (2007)10.1063/1.2745321 ↗
13. G. Gudjónsson, H.Ö. Ólafsson, F. Allerstam, P.-Å. Nilsson, E.Ö. Sveinbjörnsson, H. Zirath, T. Rödle, R. Jos, IEEE Electron Device Lett. 26, 96 (2005)10.1109/LED.2004.841191 ↗
14. K. Ueno, T. Oikawa, IEEE Electron Device Lett. 20, 624 (1999)10.1109/55.806105 ↗
15. A. Modic, G. Liu, A. C. Ahyi, Y. Zhou, P. Xu, M.C. Hamilton, J.R. Williams, L.C. Feldman, S. Dhar, IEEE Electron Device Lett. 35, 894 (2014)10.1109/LED.2014.2336592 ↗
16. Y. Mikamura, K. Hiratsuka, T. Tsuno, H. Michikoshi, S. Tanaka, T. Masuda, K. Wada, T. Horii, J. Genba, T. Hiyoshi, T. Sekiguchi, IEEE Trans. Electron Devices 62, 382 (2015)10.1109/TED.2014.2362537 ↗
17. J. Wu, J. Hu, J. H. Zhao, X. Wang, X. Li, L. Fursin, T. Burke, Solid-State Electron. 52, 909 (2008)10.1016/j.sse.2008.01.019 ↗
18. J.M. Knaup, P. Deák, T. Frauenheim, Phys. Rev. B 71, 235321 (2005)10.1103/PhysRevB.71.235321 ↗
19. F. Devynck, A. Alkauskas, P. Broqvist, A. Pasquarello, Phys. Rev. B 83, 195319 (2011)10.1103/PhysRevB.83.195319 ↗
20. P. Deák, J.M. Knaup, T. Hornos, C. Thill, A. Gali, T. Frauenheim, J. Phys. D: Appl. Phys 40, 6242 (2007)10.1088/0022-3727/40/20/S09 ↗
21. H. Kurimoto, K. Shibata, C. Kimura, H. Aoki, T. Sugino, Appl. Surf. Sci 253, 2416 (2006)10.1016/j.apsusc.2006.04.054 ↗
22. J.R. Laroche, J. Kim, J.W. Johnson, B. Luo, B.S. Kang, R. Mehandru, Y. Irokawa, S.J. Pearton, G. Chung, F. Ren, Electrochem. Solid-State Lett 7, G21 (2004)10.1149/1.1632872 ↗
23. N. Yoshida, E. Waki, M. Arai, K. Yamasaki, J.H. Han, M. Takenaka, S. Takagi, Thin Solid Films 557, 237 (2014)10.1016/j.tsf.2013.10.062 ↗
24. A.V. Penumatcha, S. Swandono, J.A. Cooper, IEEE Trans. Electron Devices 60, 923 (2013)10.1109/TED.2013.2237777 ↗
25. S. Ezhilvalavan, T.Y. Tseng, J. Am. Ceram. Soc. 82, 600 (1999)10.1111/j.1151-2916.1999.tb01807.x ↗
26. H. Matsuura, M. Takahashi, S. Nagata, K. Taniguchi, J. Mater. Sci. Mater. Electron 19, 810 (2008)10.1007/s10854-007-9454-7 ↗
27. X.D. Chen, S. Dhar, T.I. Smith, J.R. Williams, L.C. Feldman, P.M. Mooney, J. Appl. Phys 103, 033701 (2008)10.1063/1.2837028 ↗
28. V.V. Afanas’ev, A. Stesmans, F. Ciobanu, G. Pensl, K.Y. Cheong, S. Dimitrijev, Appl. Phys. Lett. 82, 568 (2003)10.1063/1.1532103 ↗
29. E. Pippel, J. Woltersdorf, H.Ö. Ólafsson, E.Ö. Sveinbjörnsson, J. Appl. Phys 97, 034302 (2005)10.1063/1.1836004 ↗
30. P. Fiorenza, A. Frazzetto, A. Guarnera, M. Saggio, F. Roccaforte, Appl. Phys. Lett. 105, 142108 (2014)10.1063/1.4898009 ↗
31. J.P. Xu, P.T. Lai, C.L. Chan, Y.C. Cheng, Appl. Phys. Lett. 76, 372 (2000)10.1063/1.126120 ↗
32. H. Yano, F. Katafuchi, T. Kimoto, H. Matsunami, IEEE Trans. Electron Devices 46, 504 (1999)10.1109/16.748869 ↗
33. R. Yeluri, X. Liu, B.L. Swenson, J. Lu, S. Keller, U.K. Mishra, J. Appl. Phys 114, 083718 (2013)10.1063/1.4819402 ↗
34. J. Tan, M.K. Das, J.A. Cooper Jr., M.R. Melloch, Appl. Phys. Lett. 70, 2280 (1997)10.1063/1.119262 ↗