journal article·2014-11

Microstructure of thermoelectric (Bi0.15Sb0.85)2Te3 film

Koksal Yildiz, Unal Akgul, Hartmut S. Leipner, Yusuf Atici

Applied Physics A· Volume 117· Issue 3
Publisher page

Abstract

The film of thermoelectric ternary p-type (Bi0.15Sb0.85)2Te3 was deposited on polyimide foil substrate at 168 °C using direct-current magnetron sputtering. Microstructural investigations of the film were performed by electron microscopy techniques. SEM observations showed that the film surface consisted of large-sized particulates with small-sized particles and also mound-like crystal agglomerates in some areas. Chemical composition of the film was analyzed using energy-dispersive X-ray spectrometer (EDS). It has been observed that the EDS results were in an agreement with nominal composition for the film. Detailed microstructural investigations were carried out using transmission electron microscopy (TEM). TEM images and selected area electron diffraction patterns showed that the film has randomly oriented polycrystalline grain structure. High-resolution TEM images indicated that the microstructure of film also contained nano-crystal structure, smaller than 10 nm.
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Research context

OpenAlex topics: Advanced Thermoelectric Materials and Devices · Thermal Radiation and Cooling Technologies · Advanced Thermodynamics and Statistical Mechanics

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (38)

Show source-provided references
1. M. Takashiri, K. Miyazaki, H. Tsukamoto, Thin Solid Films 516, 6336 (2008)10.1016/j.tsf.2007.12.130 ↗
2. L. Bu, W. Wang, H. Wang, Appl. Surf. Sci. 253, 3360 (2007)10.1016/j.apsusc.2006.07.040 ↗
3. Y.-B. Zhu, W. Wang, Thin Solid Films 520, 2474 (2012)10.1016/j.tsf.2011.10.020 ↗
4. B. Poudel, Q. Hao, Y. Ma, Y. Lan, A. Minnich, B. Yu, X. Yan, D. Wang, A. Muto, D. Vashaee, X. Chen, J. Liu, M.S. Dresselhaus, G. Chen, Z. Ren, Science 320, 634 (2008)10.1126/science.1156446 ↗
5. X.B. Zhao, X.H. Ji, Y.H. Zhang, T.J. Zhu, J.P. Tu, X.B. Zhang, Appl. Phys. Lett. 86, 062111 (2005)10.1063/1.1863440 ↗
6. X.W. Wang, H. Lee, Y.C. Lan, G.H. Zhu, G. Joshi, D.Z. Wang, J. Yang, A.J. Muto, M.Y. Tang, J. Klatsky, S. Song, M.S. Dresselhaus, G. Chen, Z.F. Ren, Appl. Phys. Lett. 93, 193121 (2008)10.1063/1.3027060 ↗
7. J. Xu, H. Li, B. Du, X. Tang, Q. Zhang, C. Uher, J. Mater. Chem. 20, 6138 (2010)10.1039/c0jm00138d ↗
8. P.F.P. Poudeu, A. Guéguen, C.-I. Wu, T. Hogan, M.G. Kanatzidis, Chem. Mater. 22, 1046 (2010)10.1021/cm902001c ↗
9. X. Shi, J. Yang, J.R. Salvador, M. Chi, J.Y. Cho, H. Wang, S. Bai, J. Yang, W. Zhang, L. Chen, J. Am. Chem. Soc. 133, 7837 (2011)10.1021/ja111199y ↗
10. S.H. Yang, T.J. Zhu, T. Sun, J. He, S.N. Zhang, X.B. Zhao, Nanotechnology 19, 245707 (2008)10.1088/0957-4484/19/24/245707 ↗
11. J.M.O. Zide, J.-H. Bahk, R. Singh, M. Zebarjadi, G. Zeng, H. Lu, J.P. Feser, D. Xu, S.L. Singer, Z.X. Bian, A. Majumdar, J.E. Bowers, A. Shakouri, A.C. Gossard, J. Appl. Phys. 108, 123702 (2010)10.1063/1.3514145 ↗
12. C. Navone, M. Soulier, M. Plissonnier, A.L. Seiler, J. Electron. Mater. 39(9), 1755 (2010)10.1007/s11664-010-1187-3 ↗
13. D. Bourgault, C.G. Garampon, N. Caillault, L. Carbone, J.A. Aymami, Thin Solid Films 516, 8579 (2008)10.1016/j.tsf.2008.06.001 ↗
14. R. Venkatasubramanian, E. Siivola, T. Colpitts, B. O’Quinn, Nature 413, 597 (2001)10.1038/35098012 ↗
15. I. Chowdhury, R. Prasher, K. Lofgreen, G. Chrysler, S. Narasimhan, R. Mahajan, D. Koester, R. Alley, R. Venkatasubramanian, Nat. Nanotechnol. 4, 235 (2009)10.1038/nnano.2008.417 ↗
16. B. Huang, C. Lawrence, A. Gross, G.-S. Hwang, N. Ghafouri, S.-W. Lee, H. Kim, C.-P. Li, C. Uher, K. Najafi, M. Kaviany, J. Appl. Phys. 104, 113710 (2008)10.1063/1.3033381 ↗
17. K. Rothe, M. Storduer, F. Heyroth, F. Syrowatka, H.S. Leipner, J. Electron. Mater. 39(9), 1408 (2010)10.1007/s11664-010-1325-y ↗
18. M. Pelliccione, T. Karabacak, T.-M. Lu, Phys. Rev. Lett. 96, 146105 (2006)10.1103/PhysRevLett.96.146105 ↗
19. M. Pelliccione, T. Karabacak, C. Gaire, G.-C. Wang, T.-M. Lu, Phys. Rev. B 74, 125420 (2006)10.1103/PhysRevB.74.125420 ↗
20. T. Karabacak, H. Guclu, M. Yuksel, Phys. Rev. B 79, 195418 (2009)10.1103/PhysRevB.79.195418 ↗
21. M. Pelliccione, T.-M. Lu, Evolution of thin film morphology: modeling and simulations (Springer, New York, 2007)
22. D.-H. Kim, G.-H. Lee, Mater. Sci. Eng. B 131, 106 (2006)10.1016/j.mseb.2006.03.034 ↗
23. Y. Ma, W.A. Wijesekar, A.E.C. Palmqvist, J. Electron. Mater. 41(6), 1138 (2012)10.1007/s11664-011-1790-y ↗
24. K. Yildiz, U. Akgul, H.S. Leipner, Y. Atici, Superlattice. Microst. 58, 60 (2013)10.1016/j.spmi.2013.02.013 ↗
25. W. Xie, X. Tang, Y. Yan, Q. Zhang, T.M. Tritt, Appl. Phys. Lett. 94, 102111 (2009)10.1063/1.3097026 ↗
26. Y. Ma, Q. Hao, B. Poudel, Y. Lan, B. Yu, D. Wang, G. Chen, Z. Ren, Nano Lett. 8(8), 2580 (2008)10.1021/nl8009928 ↗
27. J.S. Son, M.K. Choi, M.-K. Han, K. Park, J.-Y. Kim, S.J. Lim, M. Oh, Y. Kuk, C. Park, S.-J. Kim, T. Hyeon, Nano Lett. 12, 640 (2012)10.1021/nl203389x ↗
28. T.C. Harman, P.J. Taylor, M.P. Walsh, B.E. LaForge, Science 297, 2229 (2002)10.1126/science.1072886 ↗
29. T.C. Harman, M.P. Walsh, B.E. LaForge, G.W. Turner, J. Electron. Mater. 34(5), L19 (2005)10.1007/s11664-005-0083-8 ↗
30. M. Takashiri, K. Miyazaki, S. Tanaka, J. Kurosaki, D. Nagai, H. Tsukamoto, J. Appl. Phys. 104, 084302 (2008)10.1063/1.2990774 ↗
31. W. Xie, J. He, H.J. Kang, X. Tang, S. Zhu, M. Laver, S. Wang, J.R.D. Copley, C.M. Brown, Q. Zhang, T.M. Tritt, Nano Lett. 10, 3283 (2010)10.1021/nl100804a ↗
32. S. Li, M.S. Toprak, H.M.A. Soliman, J. Zhou, M. Muhammed, D. Platzek, E. Müler, Chem. Mater. 18, 3627 (2006)10.1021/cm060171o ↗
33. P.F.P. Poudeu, J. D’Angelo, H. Kong, A. Downey, J.L. Short, R. Pcionek, T.P. Hogan, C. Uher, M.G. Kanatzidis, J. Am. Chem. Soc. 128, 14347 (2006)10.1021/ja0647811 ↗
34. H. Huang, W.-L. Luan, S.-T. Tu, Thin Solid Films 517, 3731 (2009)10.1016/j.tsf.2009.01.015 ↗
35. Z.-G. Chen, G. Han, L. Yang, L. Cheng, J. Zou, Prog. Nat. Sci. Mater. Int. 22(6), 535 (2012)10.1016/j.pnsc.2012.11.011 ↗
36. J.-F. Li, W.-S. Liu, L.-D. Zhao, M. Zhou, NPG Asia Mater. 2(4), 152 (2010)10.1038/asiamat.2010.138 ↗
37. C.J. Vineis, A. Shakouri, A. Majumdar, M.G. Kanatzidis, Adv. Mater. 22, 3970 (2010)10.1002/adma.201000839 ↗
38. L.D. Hicks, M.S. Dresselhaus, Phys. Rev. B 47, 12727 (1993)10.1103/PhysRevB.47.12727 ↗