journal article·2014-09

Investigation of the crystallinity, structural, and optical properties in hydrotreating of Li–W co-doped ZnO thin films

Yichuan Chen, Yuehui Hu, Xiaohua Zhang, Defu Ma, Ximei Liu, Zhiming Zhang, Bin Xu

Applied Physics A· Volume 116· Issue 3
Publisher page

Abstract

The hydrotreated Li–W co-doped ZnO (LWZO:H) thin films was prepared on quartz glass substrates by RF magnetron sputtering at substrate temperature 100 °C with varied hydrogen flow ratios. The X-ray diffraction spectra indicated that the hydrotreating Li–W co-doped ZnO films showed a preferred orientation toward the c-axis. The chemical compositions of all samples were confirmed by X-ray photoelectron spectroscopy, which clearly showed the existence of W as a doping element into ZnO crystal lattice. The surface morphology of LWZO:H thin films changed with the increasing R value can clearly be seen. The average transmittance of the films was found to be almost 85 % for the wavelength range of 400–1,200 nm. Meanwhile, the optical band gap increase of the films may be attributed to the band Burstein–Moss effect.
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Research context

OpenAlex topics: ZnO doping and properties · Copper-based nanomaterials and applications · Perovskite Materials and Applications

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References (26)

Show source-provided references
1. Y.S. Kim, W.P. Tai, Appl. Surf. Sci. 253, 4911–4916 (2007)10.1016/j.apsusc.2006.10.068 ↗
2. J. Müller, B. Rech, J. Springer, V. Milan, Sol. Energy 77, 917–930 (2004)10.1016/j.solener.2004.03.015 ↗
3. W.T. Yen, Y.C. Lin, J.H. Ke, Appl. Surf. Sci. 257, 960–968 (2010)10.1016/j.apsusc.2010.08.001 ↗
4. M. Joseph, H. Tabata, T. Kawai, Jpn. J. Appl. Phys. Part 2(38), L1205 (1999)10.1143/JJAP.38.L1205 ↗
5. J.M. Bian, X.M. Li, X.D. Gao, W.D. Yu, L.D. Chen, Appl. Phys. Lett. 84, 541 (2004)10.1063/1.1644331 ↗
6. J.G. Lu, Z.Z. Ye, F. Zhuge, Y.J. Zeng, B.H. Zhao, L.P. Zhu, Appl. Phys. Lett. 85, 3134 (2004)10.1063/1.1803935 ↗
7. J.Z. Shao, W.W. Dong, D. Li, R.H. Tao, Z.H. Deng, T. Wang, G. Meng, S. Zhou, X.D. Fang, Thin Solid Films 518, 5288–5291 (2010)10.1016/j.tsf.2010.04.068 ↗
8. X.N. Li, B. Keyes, S. Asher, S.B. Zhang, S.H. Wei, T.J. Coutts, S. Limpijumnong, C.G. Van de Walle, Appl. Phys. Lett. 86, 122107 (2005)10.1063/1.1886256 ↗
9. Y.S. Kim, C.H. Park, Phys. Rev. Lett. 102, 086403 (2009)10.1103/PhysRevLett.102.086403 ↗
10. Y.R. Park, J. Kim, Y.S. Kim, App. Sur. Sci. 255(22), 9010–9014 (2009)10.1016/j.apsusc.2009.06.083 ↗
11. W.W. Zhong, F.M. Liu, L.G. Cai, C.C. Zhou, L.G. Zeng, X.Q. Liu, Y. Li, J. All. Com. 509(9), 3847–3851 (2011)10.1016/j.jallcom.2010.12.118 ↗
12. J. Kanungo, H. Saha, S. Basu, Sen. Act. B: Chem. 147(1), 128–136 (2010)10.1016/j.snb.2010.03.044 ↗
13. M. Sano, T. Adaniya, T. Fujitani, J. Nakamura, Surf. Sci. 514, 261 (2002)10.1016/S0039-6028(02)01639-4 ↗
14. Y. Jin, Q. Cui, G. Wen, Q. Wang, J. Hao, S. Wang, J. Zhang, J. Phys. D Appl. Phys. 42, 215007 (2009)10.1088/0022-3727/42/21/215007 ↗
15. C.D. Wanger, W.M. Riggs, LE Davis, J.F. Moulder, G.E. Muilenberg, Handb (Perkin-Elmer, Eden Prairie, 1979)
16. S. Aksoy, Y. Caglar, S. Ilican, M. Caglar, J. Alloy. Compd. 512, 171–178 (2012)10.1016/j.jallcom.2011.09.058 ↗
17. J.H. Zheng, Q. Jiang, J.S. Lian, Appl. Surf. Sci. 257, 5083–5087 (2011)10.1016/j.apsusc.2011.01.025 ↗
18. J.F. Moulder, W.F. Stickle, P.E. Sobol, K.D. Bomben, in J. Chastain (Ed.), (MN; USA, 1992), p 89
19. J. Das, S.K. Pradhan, D.R. Sahu, D.K. Mishra, S.N. Sarangi, B.B. Nayak, S. Verma, B.K. Roul, Phys. B 405, 2492–2497 (2010)10.1016/j.physb.2010.03.020 ↗
20. P. Chatchai, Y. Murakami, S. Kishioka, A.Y. Nosaka, Y. Nosaka, Electrochim. Acta 54, 1147–1152 (2009)10.1016/j.electacta.2008.08.058 ↗
21. T.G.G. Maffeis, M.W. Penny, A. Castaing, O.J. Guy, S.P. Wilks, Sur. Sci. 606, 99 (2012)10.1016/j.susc.2011.09.007 ↗
22. X.Y. Li, Y.L. Wang, W.F. Liu, G.S. Jiang, C.F. Zhu, Mater. Lett. 85, 25 (2012)10.1016/j.matlet.2012.06.107 ↗
23. S. Aksoy, Y. Caglar, S. Ilican, M. Caglar, J. All. Com. 512, 171–178 (2012)10.1016/j.jallcom.2011.09.058 ↗
24. Z.C. Pan, X.L. Tian, S.K. Wu, X. Yu, Z.L. Li, J.F. Deng, C.M. Xiao, G.H. Hu, Z.G. Wei, App. Sur. Sci. 265, 870–877 (2013)10.1016/j.apsusc.2012.11.139 ↗
25. S. Ameen, M.S. Akhtar, H.K. Seo, Y.S. Kim, H.S. Shin, Chem. Eng. J. 187, 351–356 (2012)10.1016/j.cej.2012.01.097 ↗
26. C.E. Kim, P. Moon, S. Kim, J.M. Myoung, H.W. Jang, J. Bang, I. Yun, Thin Solid Films 518, 6304–6307 (2010)10.1016/j.tsf.2010.03.042 ↗