Improvement of surface smoothness of Nd:KGd(WO4)2 films by nozzle-gas-assisted pulsed-laser deposition
Source abstract
Abstract
We have demonstrated efficient film oxidation of Nd:KGW [or Nd:KGd(WO4)2] films using a newly developed nozzle-gas-assisted pulsed-laser deposition (NGA-PLD) method. This technique is systematically studied and experimentally compared to the conventional PLD (C-PLD) method. A dramatic improvement in the film surface morphology is achieved with NGA-PLD. The NGA-PLD enables the efficient film oxidation under lower ambient pressures than the C-PLD technique, which realizes well-crystallized films with smoother surfaces. This simple technique will be very useful for fabrication of a variety of multi-component oxide films.
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Research context
OpenAlex topics: Solid State Laser Technologies · Luminescence Properties of Advanced Materials · Optical properties and cooling technologies in crystalline materials
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References (27)
Show source-provided references
1. M. Jerinek: Czech. J. Phys. 53, 365 (2003)10.1023/A:1024054216086 ↗
2. M. Ezaki, H. Kumagai, K. Kobayashi, K. Toyoda, M. Obara: Jpn. J. Appl. Phys. 34, 6838 (1995)10.1143/JJAP.34.6838 ↗
3. A.A. Anderson, C.L. Bonner, D.P. Shepherd, R.W. Eason, C. Grivas, D.S. Gill, N. Vainos: Opt. Commun. 144, 183 (1997)10.1016/S0030-4018(97)00460-4 ↗
4. S. Fukaya, T. Hasegawa, Y. Ishida, T. Shimoda, M. Obara: Appl. Surf. Sci. 177, 147 (2001)10.1016/S0169-4332(01)00183-0 ↗
5. T. Shimoda, Y. Ishida, K. Adachi, M. Obara: Opt. Commu. 194, 175 (2001)10.1016/S0030-4018(01)01269-X ↗
6. A.A. Anderson, R.W. Eason, L.M.B. Hickey, M. Jelinek, C. Grivas: Opt. Lett. 22, 1556 (1997)10.1364/OL.22.001556 ↗
7. P.A. Atanasov, M. Jiménez de Castro, A. Perea, J. Perriére, J. Gonzalo, C.N. Afonso: Appl. Surf. Sci. 186, 469 (2002)10.1016/S0169-4332(01)00743-7 ↗
8. M. Jelínek, J. Lanèok, M. Pavelka, P.A. Atanasov, A. Macková, F. Flory, C. Garapon: Appl. Phys. A 74, 481 (2002)10.1007/s003390101069 ↗
9. P.A. Atanasov, A. Perea, M. Jiménez de Castro, J.A. Chaos, J. Gonzalo, C.N. Afonso, J. Perriére: Appl. Phys. A 74, 109 (2002)10.1007/s003390100975 ↗
10. I.V. Mochalov: Opt. Eng. 36, 1660 (1995)10.1117/1.601185 ↗
11. V. Kushawaha, Y. Yan, Y. Chen: Appl. Phys. B 62, 533 (1996)10.1007/BF01081056 ↗
12. J. Findeisen, H.J. Eichler, A.A. Kaminski: IEEE J. Quantum. Electron. QE-35, 173 (1999)10.1109/JQE.1999.740738 ↗
13. O. Musset, J.P. Boquillon: Appl. Phys. B 64, 503 (1997)10.1007/s003400050206 ↗
14. D.B. Chrisey, G.K. Hubler: Pulsed laser deposition of thin films (Wiley & Sons, New York 1994)
15. A. Ito, A. Machida, M. Obara: Jpn. J. Appl. Phys. Lett. 36, 805 (1997)10.1143/JJAP.36.L805 ↗
16. M.D. Strikovsky, E.B. Klyuenkov, S.V. Gaponov, J. Schubert, C.A. Copetti: Appl. Phys. Lett. 63, 1146 (1993)10.1063/1.110773 ↗
17. N. Inoue, T. Ozaki, T. Monnaka, S. Kashiwabara, R. Fujimoto: Jpn. J. Appl. Phys. 36, 704 (1997)10.1143/JJAP.36.704 ↗
18. A.C. Rastogi, S. Tirurnala, S.B. Desu: Appl. Phys. Lett. 74, 3492 (1999)10.1063/1.124140 ↗
19. T. Okato, P.A. Atanasov, R.I. Tomov, M. Obara: Appl. Phys. A 77, 775 (2003)10.1007/s00339-003-2224-3 ↗
20. T. Okato, P.A. Atanasov, M. Obara: Appl. Phys. A 77, 375 (2003)10.1007/s00339-003-2185-6 ↗
21. P.A. Atanasov, T. Okato, R.I. Tomov, M. Obara: Thin Solid Films 453?454, 150 (2004)10.1016/j.tsf.2003.11.089 ↗
22. M. Usami, K. Teshima: JSME Int. J. Ser. B, Fluids Therm. Eng. 42, 369 (1999)10.1299/jsmeb.42.369 ↗
23. M. Bellotto, A. Caridi, E. Cereda, G. Gabetta, M. Scagliotti, G.M.B. Marcazzan: Appl. Phys. Lett. 63, 2056 (1993)10.1063/1.110590 ↗
24. R. Collongues: Jpn J. Appl. Phys. Suppl. 32, 442 (1993)10.7567/JJAPS.32S3.442 ↗
25. M.J. Martin, J.E. Alfonso, J. Mendiola, C. Zaldo, D.S. Gill, R.W. Eason, P.J. Chandler: J. Mater. Res. 12, 2699 (1997)10.1557/JMR.1997.0359 ↗
26. P.E. Dyer, A. Issa, P.H. Key: Appl. Surf. Sci. 46, 89 (1990)10.1016/0169-4332(90)90125-J ↗
27. J. Gonzalo, C.N. Afonso, J.M. Ballesteros, A. Grosman, C. Ortega: J. Appl. Phys. 82, 3129 (1997)10.1063/1.366155 ↗