journal article·1993-05

Use of langmuir probes for monitoring of precursor concentrations during plasma activated chemical vapor deposition of hard coatings

P. Špatenka, H. Suhr

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Abstract

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Research context

OpenAlex topics: Metal and Thin Film Mechanics · Analytical Chemistry and Sensors · Semiconductor materials and devices

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References (12)

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1. H. Suhr: Plasma Chem. Plasma Process. 9 (1989), Supplement 7S10.1007/BF01015871 ↗
2. H. Wendel, H. Suhr: Appl. Phys. A54, 389 (1992)10.1007/BF00324208 ↗
3. H. Wendel: Keramische Schutzschichten durch Plasmainduzierte Gasphaseabscheidung, Dissertation, Universität Tübingen (1991) [in German]
4. P. Špatenka, R. Studeny, H. Suhr: Meas. Sci. Technol. 3, 704 (1992)10.1088/0957-0233/3/8/003 ↗
5. Ch. Steinbruchel: J. Electrochem. Soc.: Solid-State Sci. Technol. 130, 648 (1983)10.1149/1.2119774 ↗
6. M.J. Kushner: J. Appl. Phys. 53, 2939 (1982)10.1063/1.331075 ↗
7. B.C. Bell, D.A. Glocker: J. Vac. Sci. Technol. A 6, 2047 (1988)10.1116/1.575598 ↗
8. P.Špatenka, H. Suhr: Plasma Chem. Plasma Process (in print)
9. A. Streitweiser, Jr.: Ionization Potential in Organic Chemistry, Progr. Phys. Org. Chem. 1, 1–30 (1963)10.1002/9780470171806.ch1 ↗
10. H. Suhr: Surface and Coating Technology 49, 223 (1991)10.1016/0257-8972(91)90061-Z ↗
11. F.W. Breitbarth, J. Bald, S. Rodemeyer, H. Suhr: Mass and Emission Spectroscopical Process Control in Plasma Enhanced CVD of Oxides from Organometallic Compounds (ISPC-10, Bochum 1991) p.2.4–30
12. Strem Chemical Inc.: Catalog No. 14 (1992)