Laser effects in silicon with deep amorphous layer
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Laser Material Processing Techniques
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References (9)
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1. See, for example, the proceedings of “Laser effect in ion implanted semiconductors”, ed. by E.Rimini Istituto di Struttura della Materia, Catania (1978),
2. Italy “Ion beam modification of materials”, ed. by J.Gyulai, Central Research Institute, Budapest (1978).
3. “Laser-solid interactions and laser processing”, ed. by S.D.Ferris, H.J.Leamy and J.M.Poate. (American Physical Society, Boston 1979)
4. I.B.Khaibullin, E.I.Shtyrkov, M.M.Zaripov, R.M.Bayazitov, M.F.Galyatudinov: Radiat. Eff.36, 225 (1978)10.1080/00337577808240852 ↗
5. P.Baeri, S.U.Campisano, G.Foti, E.Rimini: J. Appl. Phys.50, 788 (1979)10.1063/1.326046 ↗
6. D.H.Auston, C.M.Surko, T.N.C.Venkatesan, R.E.Shusher, J.A.Golovchenko: Appl. Phys. Lett.33, 437 (1978)10.1063/1.90369 ↗
7. P.Baeri, S.U.Campisano, G.Foti, E.Rimini. Phys. Rev. Lett.41, 1246 (1978)10.1103/PhysRevLett.41.1246 ↗
8. M.H.Brodsky, R.S.Title, K.Weiser, G.D.Pettit: Phys. Rev. B1, 2632 (1970)10.1103/PhysRevB.1.2632 ↗
9. J.F.Ziegler, W.K.Chu: At Data Nucl. Data Tables13, 463 (1974)10.1016/0092-640X(74)90009-6 ↗