C-V Technique on Schottky contacts — Limitation of implanted profiles
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Research context
OpenAlex topics: Semiconductor materials and interfaces · Force Microscopy Techniques and Applications · Electrical Contact Performance and Analysis
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References (11)
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1. R.A. Moline: J. Appl. Phys.42, 3553 (1971)10.1063/1.1660769 ↗
2. Ch.L. Wilson: IEEE Trans. ED-27, 2262 (1980)10.1109/T-ED.1980.20262 ↗
3. D.J. Bartelink, R.E. Tremain: IEEE Trans. ED-26, 1831 (1979)10.1109/T-ED.1979.19708 ↗
4. J. Gibbons, W.S. Johnson, S.W. Mylroie:Projected Range Statistic —Semiconductors and Related Mat. (Dowden, Hutchinson, and Ross, Strondsburg 1975)
5. B.L. Sharma, S.C. Gupta: Solid State Technol.23, 90 (1980)10.1016/0038-1101(80)90104-5 ↗
6. S.M. Sze, G. Gibbons: Appl. Phys. Lett.8, 111 (1966)10.1063/1.1754511 ↗
7. D.P. Kennedy, R.R. O'Brien: IBM J. Develop.13, 212 (1969)10.1147/rd.132.0212 ↗
8. H. Ryssel, I. Ruge:Ionen Implantation (Geest-Portig, Leipzig 1978)
9. W.C. Johnson, P.T. Panousis: IEEE Trans. ED-18, 965 (1971)10.1109/T-ED.1971.17311 ↗
10. W.E. Carter, H.K. Gummel, B.R. Chawla: Solid State Electron.15, 195 (1972)10.1016/0038-1101(72)90053-6 ↗
11. K. Ziegler, E. Klausmann, S. Kar: Solid State Electron.18, 189 (1975)10.1016/0038-1101(75)90102-1 ↗