Laser-induced chemical etching of silicon in NF3 atmosphere
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Laser Material Processing Techniques · Advanced Surface Polishing Techniques · Silicon Nanostructures and Photoluminescence
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (29)
Show source-provided references
1. L.M. Eprath, D.J. DiMaria: Solid State Techn.24(4), 182 (1981)
2. S.J. Fonash: Solid State Techn.28(4), 201 (1985)
3. G.S. Oehrlein: Phys. Today39, 1 (October 1986)10.1063/1.881066 ↗
4. S.W. Pang: Microelectron. Engineer.5, 351 (1986)10.1016/0167-9317(86)90064-X ↗
5. D.L. Flam, V.M. Donnelly: Plasma Chem. Plasma Process.1, 317 (1981)10.1007/BF00565992 ↗
6. N.J. Ianno, K.E. Greenberg, J.T. Verdeyen: J. Electrochem. Soc.128, 2174 (1981)10.1149/1.2127212 ↗
7. K.J. Nordheden, J.T. Verdeyen: J. Electrochem. Soc.133, 2168 (1986)10.1149/1.2108363 ↗
8. K.E. Greenberg, J.T. Verdeyen: J. Appl. Phys.57, 1596 (1985)10.1063/1.334477 ↗
9. H. Cerva, E.-G. Mohr, H. Oppolzer: J. Vac. Sci. Techn.B5, 590 (1987)10.1116/1.583954 ↗
10. M. Konuma, M. Singh, S. Subramanian, J. Werner, E. Bauser: Proc. 8th Int'l Symp. Plasma Chem., Tokyo (1987), p. 1663
11. T.J. Chuang: J. Vac. Sci. Techn.21, 798 (1982)10.1116/1.571827 ↗
12. T.W. Brewer, G.M. Rekster, R.M. Osgood, Jr.: Solid State Techn.28(4), 273 (1985)
13. D. B�uerle:Chemical Processing with Lasers, Springer Ser. Mat. Sci.1 (Springer, Berlin, Heidelberg 1986)
14. I.W. Boyd:Laser Processing of Thin Films and Microstructures, Springer Ser. Mat. Sci.3 (Springer, Berlin, Heidelberg 1987)
15. T. Baller, D.J. Oostra, A.E. de Vries, G.N.A. van Veen: J. Appl. Phys.60, 2321 (1986)10.1063/1.337142 ↗
16. P. Mogyor�si, K. Piglmayer, R. Kullmer, D. B�uerle: Appl. Phys. A45, 293 (1988)10.1007/BF00617934 ↗
17. Y. Horiike, N. Hayasaka, M. Sekine, T. Arikado, M. Nakase, H. Okano: Appl. Phys. A44, 313 (1987)10.1007/BF00624598 ↗
18. C.V. Treyz, R. Beach, R.M. Osgood, Jr.: InPhoton, Beam, and Plasma Stimulated Chemical Processes at Surface, ed. by V.M. Donnelly, I.P. Hermann, M. Hirose. MRS Proc.75 (Material Research Society, Pittsburgh 1987), p. 377
19. G.L. Loper, M.D. Tabat: InPhoton, Beam, and Plasma Stimulated Chemical Processes at Surface, ed. by V.M. Donnelly, I.P. Herman, M. Hirose. MRS Proc.75 (Material Research Society, Pittsburgh 1987), p. 385
20. D.J. Ehrlich, J.Y. Tsao: J. Vac. Sci. Techn.B1, 969 (1983)10.1116/1.582718 ↗
21. D.J. Ehrlich, R.M. Osgood, Jr., T.F. Deutsch: Appl. Phys. Lett.38, 1018 (1981)10.1063/1.92228 ↗
22. L.L. Sveshnikova, V.I. Donin, S.M. Repinskii: Sov. Tech. Phys. Lett.3, 223 (1977)
23. F.A. Houle: J. Chem. Phys.79, 4237 (1983)10.1063/1.446350 ↗
24. F.A. Houle: Chem. Phys. Lett.95, 5 (1983)10.1016/0009-2614(83)80799-4 ↗
25. W. Holber, G. Rekesten, R.M. Osgood, Jr.: Appl. Phys. Lett.46, 201 (1985)10.1063/1.95684 ↗
26. J.A. Dagata, D.W. Squire, C.S. Dulcey, D.S.Y. Hsu, M.C. Lin: Chem. Phys. Lett.134, 151 (1987)10.1016/0009-2614(87)87112-9 ↗
27. T.T. Kodas, T.H. Braun, B. Comita: InPhoton, Beam, and Plasma Simulated Chemical Processes at Surface, ed. by V.M. Donelly, I.P. Herman, M. Hirose. MRS Proc.75 (Material Research Society, Pittsburgh 1987), p. 57
28. M. Hirose, S. Yokoyama, Y. Yamakage: J. Vac. Sci. Techn.B3, 1445 (1985)10.1116/1.583007 ↗
29. Y.I. Nissim, A. Lietoila, R.B. Gold, J.F. Gibbons: J. Appl. Phys.52, 274 (1980)10.1063/1.327420 ↗