Self-assembly of a linear mesoscale tetramer with electrical connectivity
Source abstract
Abstract
Capillary interaction-based self-assembly of block-shaped mesoscale components into an electrically interconnected 1-D tetramer is reported. Low melting point solder droplets, selectively patterned on the faces of the blocks, were employed to drive the sequential alignment, registration, linking and electrical interconnection of each block. The solder patterns were designed so that successful assembly would only occur when the solder patterns on one block face were correctly aligned with those on the face of an adjacent block. For assembly, the blocks were agitated in a flask containing KBr solution. At 60 °C the solder was molten, and collisions between blocks enabled the solder menisci to easily interact. To minimize interfacial free energy, the menisci coalesced and quickly drove the interacting blocks to form a stable, registered and aligned assembly. When agitation was terminated and the solution cooled, the self-aligned, linear tetrameric arrangement of blocks was permanently captured by solder solidification, a process that provided good mechanical bonding and electrical interconnection between each block.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Modular Robots and Swarm Intelligence · Advanced Materials and Mechanics · Micro and Nano Robotics
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References (11)
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1. Bowden NB, Weck M, Choi IS, Whitesides GM (2001) Acc. Chem. Res. 34:23110.1021/ar0000760 ↗
2. Whitesides GM, Grzybowski B (2002) Science 295:241810.1126/science.1070821 ↗
3. Yeh JH-J, Smith JS (1994) IEEE Photon. Technol. Lett. 6:70610.1109/68.300169 ↗
4. Lee SC, Lee H, Westervelt RM (2001) Appl. Phys. Lett. 79:330810.1063/1.1419049 ↗
5. Murakami Y, Idegami K, Nagai H, Kikuchi T, Morita Y, Yamamura A, Yokoyama K, Tamiya E (2000) Mater. Sci. Eng. C 12:6710.1016/S0928-4931(00)00160-0 ↗
6. Srinivasan U, Liepmann D, Howe RT (2001) J. Microelectromech. Syst. 10:1710.1109/84.911087 ↗
7. O’Riordan A, Delaney P, Redmond G (2004) Nano Lett. 4 761:76110.1021/nl034145q ↗
8. Böhringer KF, Srinivasan U, Howe RT (2001) IEEE Proc. Micro Electro Mechanical Systems (MEMS), Interlaken, Switzerland 369:369
9. Jacobs HO, Tao AR, Schwartz A, Gracias DH, Whitesides GM (2002) Science 296:32310.1126/science.1069153 ↗
10. Gracias DH, Tien J, Breen TL, Hsu C, Whitesides GM (2000) Science 289:117010.1126/science.289.5482.1170 ↗
11. Boncheva M, Gracias DH, Jacobs HO, Whitesides GM (2002) PNAS 99:493710.1073/pnas.032667599 ↗