journal article·1996-04

Electrical characteristics of the rf-excited oxygen plasma-cathodization-grown SiO2/Si interface

Z. X. Liang, Z. S. Han, J. S. Loua, L. C. Wang

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Semiconductor materials and devices · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

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References (12)

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