journal article·1996-07

Arc plasma jet cleaning of the silicon surface before CoSi2/Si contact formation

G. Ya. Pavlov, V. P. Pugachevich, D. G. Gromov, E. B. Kudryashova

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Semiconductor materials and interfaces · Semiconductor materials and devices · Integrated Circuits and Semiconductor Failure Analysis

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References (12)

Show source-provided references
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4. G. Zou, F. Jonckx, R. Donaton, W. Kuper, K. Maex, P.W. Mertens, M. Meuries, M.M. Heyns, K. Locke, M. Korac, R. Schild: InProc. 2nd Int'l Symp. on Ultra-clean Processing of Silicon Surfaces (UCPSS'94), Brugge, Belgium (1994) p. 177
5. T. Hattori: InProc. 2nd Int'l Symp. on Ultra-clean Processing of Silicon Surfaces (UCPSS'94), Brugge, Belgium (1994) p. 13
6. J. Ramm, E. Beck, A. Dommann, I. Eisele, D. Kruger: Thin Solid Films246, 158 (1994)10.1016/0040-6090(94)90745-5 ↗
7. J. Ramm, E. Beck, A. Zueger, A. Dommann, R.E. Pixley: Thin Solid Films228, 23 (1993)10.1016/0040-6090(93)90555-4 ↗
8. V.M. Maslovsky, G.Ya. Pavlov: InProc. 2nd Int'l Symp. on Ultra-clean Processing of Silicon Surfaces (UCPSS'94), Brugge, Belgium (1994) p. 83
9. G.Ya. Pavlov: 1995 MRS Spring Meeting Proc.386, 293 (1995)
10. D. Gromov, V. Pugachevich: Appl. Phys. A59, 331 (1994)10.1007/BF00348239 ↗
11. S.P. Muraka:Silicides for VLSI Applications Academic (New York, 1983)
12. G.S. Higashi, T. Boone, K. Hanson, J. Sapgeta, Y.J. Chabal, K. Raghavachari: InProc. 2nd Int'l Symp. on Ultra-clean Processing of Silicon Surfaces (UCPSS'94), Brugge, Belgium (1994) p. 62