journal article·1991-05

Study of hydrogenated amorphous silicon nitride films prepared by RF magnetron sputtering

A. K. Bandyopadhyay, T. K. Bhattacharyya, Ratnabali Banerjee, A. K. Batabyal, A. K. Barua

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OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · ZnO doping and properties

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References (19)

Show source-provided references
1. M.J. Powell, B.C. Easton, O.E. Hill: Appl. Phys. Lett. 38, 794 (1981)10.1063/1.92166 ↗
2. A.K. Sinha, H.J. Levinstein, T.E. Smith, G. Quintana, S.E. Haszko: J. Electrochem. Soc. 125, 601 (1978)10.1149/1.2131509 ↗
3. H. Nakayama, T. Enomoto: Jpn. J. Appl. Phys. 18, 1773 (1979)10.1143/JJAP.18.1773 ↗
4. S. Fujira, A. Sasaki: J. Electrochem. Soc. 132, 398 (1985)10.1149/1.2113850 ↗
5. T. Makino: J. Electrochem. Soc. 130, 450 (1983)10.1149/1.2119729 ↗
6. A. Morimoto, I. Kobayashi, M. Kumeda, T. Shimizu: Jpn. J. Appl. Phys. 25, L752 (1986)10.1143/JJAP.25.L752 ↗
7. K. Katoh, M. Yasui, H. Watanabe: Jpn. J. Appl. Phys. 22, L321 (1983)10.1143/JJAP.22.L321 ↗
8. T. Shimizu, S. Oozora, A. Morimoto, M. Kumeda, N. Ishii: Sol. Energy Mater. 8, 311 (1982)10.1016/0165-1633(82)90074-0 ↗
9. R. Banerjee, A.K. Bandyopadhyay, J.K. Rath, A.K. Batabyal, A.K. Barua: Thin Solid Films 192, 295 (1990)10.1016/0040-6090(90)90074-N ↗
10. T. Hirao, T. Kamada, M. Kitagawa, K. Setsune, K. Wasa, A. Matsuda, K. Tanaka: Jpn. J. Appl. Phys. 27, 528 (1988)10.1143/JJAP.27.528 ↗
11. Y. Manabe, T. Mitsuyu: J. Appl. Phys. 66, 2475 (1989)10.1063/1.344258 ↗
12. A.K. Batabyal, P. Chaudhuri, S. Ray, A.K. Barua: Thin Solid Films 112, 51 (1984)10.1016/0040-6090(84)90501-7 ↗
13. S. Hasegawa, M Matuura, Y. Kurata: Appl. Phys. Lett. 49, 1272 (1986)10.1063/1.97383 ↗
14. R. Kärcher, L. Ley, R.L. Johnson: Phys. Rev. B 30, 1896 (1984)10.1103/PhysRevB.30.1896 ↗
15. A. Morimoto, Y. Tsujimura, M. Kumeda, T. Shimizu: Jpn. J. Appl. Phys. 24, 1394 (1985)10.1143/JJAP.24.1394 ↗
16. D.T. Krick, P.M. Lenahan, J. Kanicki: J. Appl. Phys. 64, 3558 (1988)10.1063/1.341499 ↗
17. Y. Ihara, S. Miyazaki, M. Hirose, M. Fujita, R. Yamaguchi, K. Umenishi: Technical Digest of the International PVSEC-3, Tokyo, Japan p. 263 (1987)
18. W. Beyer, H. Wagner, H. Mell: Mat. Res. Soc. Symp. Proc. 95, 1 (1987)10.1557/PROC-95-317 ↗
19. S.-L. Wang, R.-G. Cheng, M.-W. Qi, P.-X. Cai: J. Non-Cryst. Solids 97 & 98, 1039 (1987)10.1016/0022-3093(87)90249-3 ↗