journal article·1987-01

Kinetics of Ni2Si growth from pure Ni and Ni(V) films on (111) and (100) Si

M. A. Harith, J. P. Zhang, S. U. Campisano, H. -J. Klaar

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Abstract

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Research context

OpenAlex topics: Semiconductor materials and interfaces · Surface and Thin Film Phenomena · Silicon and Solar Cell Technologies

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References (8)

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2. H. Ischiwara, K. Hikosaka, M. Nagatomo, S. Furukama: Surf. Sci.86, 711 (1979)10.1016/0039-6028(79)90451-5 ↗
3. S. Saitoh, H. Ischiwara, T. Asano, S. Furukama: Jpn. J. Appl. Phys.22, 1118 (1981)
4. K.C.R. Chiu, J.M. Poate, L.C. Feldman, C.J. Doherty: Appl. Phys. Lett.36?37, 544 (1980)10.1063/1.91574 ↗
5. G. Ottaviani: J. Vac. Sci. Technol.16, 112 (1979)10.1116/1.570170 ↗
6. K.N. Tu, W.K. Chu, J.W. Mayer: Thin Solid Films25, 403 (1975)10.1016/0040-6090(75)90058-9 ↗
7. J.O. Olowolafe, M-A. Nicolet, J.W. Mayer: Thin Solid Films38, 143 (1976)10.1016/0040-6090(76)90221-2 ↗
8. L.S. Hung, L.R. Zheng, J.W. Mayer: J. Appl. Phys.54, 792 (1983)10.1063/1.332037 ↗