journal article·1988-05

Analysis of rapid dry oxidation of silicon

M. Orlowski, V. Pless

Applied Physics A· Volume 46· Issue 1
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Silicon and Solar Cell Technologies · Semiconductor materials and devices · Thin-Film Transistor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (12)

Show source-provided references
1. H.Z. Massoud, J.D. Plummer, E.A. Irene: J. Electrochem. Soc.132, 2685 (1985)10.1149/1.2113648 ↗
2. H.Z. Massoud, J.D. Plummer, E.A. Irene: J. Electrochem. Soc.132, 2693 (1985)10.1149/1.2113649 ↗
3. H.Z. Massoud, J.D. Plummer, E.A. Irene: J. Electrochem.Soc.132, 1745 (1985)10.1149/1.2114204 ↗
4. D.B. Kao et al.: IEEE ED-34, 1008 (1987)10.1109/T-ED.1987.23037 ↗
5. V.K. Samalam: Appl. Phys. Lett.47, 736 (1985)10.1063/1.96021 ↗
6. E.A. Irene: J. Electrochem. Soc.125, 1708 (1978)10.1149/1.2131277 ↗
7. F.P. Fehlner, N.F. Mott:Oxidation of Metals and Alloys (American Society for Metals, Metals Park, Ohio 1971) p. 37
8. J.M. Gibson, D.W. Dong: J. Electrochem. Soc.127, 2722 (1980)10.1149/1.2129579 ↗
9. B.E. Deal, A.S. Grove: J. Appl. Phys.36, 3770 (1965)10.1063/1.1713945 ↗
10. A.M. Goodman, Y.M. Breece: J. Electrochem. Soc.117, 982 (1970)10.1149/1.2407703 ↗
11. W. Jüngling et al.: IEEE ED-32, 156 (1985)10.1109/T-ED.1985.21925 ↗
12. E.A. Irene: J. Appl. Phys.54, 5416 (1983)10.1063/1.332722 ↗