journal article·1988-11

Analysis of UV-Laser induced oxidation of implanted silicon by optical reflectivity measurements

F. Foulon, A. Slaoui, E. Fogarassy, C. Fuchs, P. Siffert

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Abstract

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Research context

OpenAlex topics: Laser Material Processing Techniques · Advanced Surface Polishing Techniques · Silicon and Solar Cell Technologies

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References (11)

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1. I.W. Boyd: InDielectric Layers in Semiconductors: Novel Technologies and Devices, ed. by G.G. Bentini, E. Fogarassy, A. Golanski (Les Editions de Physique, Les Ulis, France 1986) p. 177
2. E. Fogarassy, C.W. White, A. Slaoui, C. Fuchs, P. Siffert: Appl. Phys. Lett, (submitted)
3. F. Foulon, E. Fogarassy, A. Slaoui, C. Fuchs, S. Unamuno, P. Siffert: Appl. Phys.A 45, 361 (1988)10.1007/BF00617943 ↗
4. A. Slaoui, E. Fogarassy, C.W. White, P. Siffert: Appl. Phys. Lett, (submitted)
5. G.H. Schiroky: J. Math. Sci.22, 3595 (1987)10.1007/BF01161465 ↗
6. N. Bottka, P.J. Walsh, R.Z. Dalbey: J. Appl. Phys.54, 1104 (1983)10.1063/1.332126 ↗
7. E. Fogarassy, A. Slaoui, C. Fuchs: InNATO Proc. Workshop on ?Emerging technologies for in situ processing (Cargèse, France 1987)
8. Y.S. Liu, S.W. Chiang, F. Bacon: Appl. Phys. Lett.38, 1005 (1981)10.1063/1.92246 ↗
9. D.H. Lowndes, R.F. Wood, J. Narayan: Phys. Rev. Lett.52, 561 (1984)10.1103/PhysRevLett.52.561 ↗
10. American Institute of Physics Handbook, 2nd edn. (Mc Graw-Hill, New York) pp. 6?106
11. H.E. Bennett, J.O. Porteus: J. Opt. Soc. Am.51, 123 (1961)10.1364/JOSA.51.000123 ↗