journal article·1983-03

Low-power multi-pulse laser annealing of ?-Ge

G. Vitali, U. Zammit, M. Marinelli, M. Bertolotti

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OpenAlex topics: Thin-Film Transistor Technologies · Laser Material Processing Techniques · Silicon and Solar Cell Technologies

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References (24)

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1. Low power is defined as lower than the power necessary to melt the material
2. See, for example,Proc. of Laser-Solid Interactions and Laser Processing, ed. by S.D. Ferris, H.J. Leamy, and J.M. Poate, AIP Conf. No. 50 (AIP, New York 1979) Sect. 4 and 6; see moreover proceLaser and Electron Beam Processing of Materials, ed. by C.W. White and P.S. Peercy (Academic Press, New York 1980)
3. G. Vitali, M. Bertolotti, U. Zammit, M. Marinelli: Phys. Lett89 A, 199 (1982)10.1016/0375-9601(82)90208-0 ↗
4. M. Bertolotti, G. Vitali, U. Zammit, M. Marinelli: InLaser and Electron-Beam Interactions with Solids, ed. by B.R. Appleton and G.K. Celler (North-Holland, New York 1982) p. 203
5. In favour of a low surface temperature and a ?plasma? model see expecially H.W. Lo, A. Compan: Phys. Rev. Lett.44, 1604 (1980)10.1103/PhysRevLett.44.1604 ↗
6. E. Yoffa: InLaser and Electron Processing of Materials, ed. by C.W. White and P.S. Peercy (Academic Press, New York 1980) p. 6
7. In favour of a high temperature and against the ?plasma? model see W.H. Dumke: Phys. Lett.78 A, 44 (1980)10.1016/0375-9601(80)90430-2 ↗
8. N. Bloembergen, H. Kurz, J.M. Liu, R. Yen: InLaser and Electron Beam Interactions with Solids, ed. by B.R. Appleton and G.K. Celler (North-Holland, New York 1982) p. 3
9. B. Stritzker, A. Pospieszezyk, J.A. Tagle: Phys. Rev. Lett.47, 356 (1981)10.1103/PhysRevLett.47.356 ↗
10. J. Narayan, J. Fletcher, C.W. White, W.H. Christie: J. Appl. Phys.52, 7121 (1981)10.1063/1.328685 ↗
11. G. Vitali, Phys. Lett.78 A, 387 (1980)10.1016/0375-9601(80)90403-X ↗
12. G. Vitali, M. Bertolotti, U. Zammit, M. Marinelli: In [3]10.1016/0375-9601(82)90208-0 ↗
13. A.G. Cullis, H.C. Webber, P. Bailey: J. Phys. E (Sci. Instrum.)12, 688 (1979)10.1088/0022-3735/12/8/008 ↗
14. E.B. Aslanidi, E.A. Tikhonov, M.T. Shpak: Opt. Spectrosc.31, 233 (1971)
15. M. Bertolotti, D. Sette, L. Stagni, G. Vitali: Appl. Phys. Lett.18, 257 (1971); Radiat Eff.15, 31 (1972)10.1063/1.1653654 ↗
16. K. Affolter, W. Luthy, M. Wittmer: Appl. Phys. Lett.36, 559 (1980) and references therein10.1063/1.91545 ↗
17. See, for example, E. Bogh, P. Hoyild, I. Stensgaard: Radiat. Eff.7, 115 (1971)10.1080/00337577108232571 ↗
18. J.R. Meyer, F.J. Bartoli, M.R. Kruer: Phys. Rev. B21, 1559 (1980)10.1103/PhysRevB.21.1559 ↗
19. J.R. Meyer, M.R. Kruer, F.J. Bartoli: J. Appl. Phys.51, 5513 (1980)10.1063/1.327469 ↗
20. J.R. Meyer, F.J. Bartoli, M.R. Kruer: J. Phys.C4, 31 (1980)
21. J.R. Troxell, A.P. Chatterjee, G.D. Watkins, L.C. Kimerling: Phys. Rev. B19, 5336 (1979)10.1103/PhysRevB.19.5336 ↗
22. J.A. van Vechten: J. Phys. (Paris) C4, 7 (1980)
23. B. Monemar, R.M. Potemski, M.B. Small, J.A. van Vechten, G.R. Woolhouse: Phys. Lett.41, 260 (1978)10.1103/PhysRevLett.41.260 ↗
24. T. Papa, F. Scudieri: Opt. Commun.41, 431 (1982)10.1016/0030-4018(82)90171-7 ↗