journal article·1986-03

Iron contamination in ion implanted silicon, as revealed by x-ray and electron diffraction

M. Servidori, F. Cembali, P. Negrini

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Silicon and Solar Cell Technologies · Semiconductor materials and interfaces · Advanced Surface Polishing Techniques

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References (7)

Show source-provided references
1. F. Cembali, M. Servidori, A. Zani: Solid State Electron.28, 933 (1985)10.1016/0038-1101(85)90087-5 ↗
2. D. Taupin: Bull. Soc. Franc. Minér. Crist.87, 469 (1964)
3. F. Cembali, M. Servidori, E. Gabilli, R. Lotti: Phys. Status Solidi (a)87, 527 (1985)10.1002/pssa.2210870123 ↗
4. M. Servidori: Unpublished
5. N. Natsuaki, M. Tamura, M. Miyao, T. Tokuyama: Jpn. J. Appl. Phys.16, Suppl. 16?1, 47 (1977)10.7567/JJAPS.16S1.47 ↗
6. P.F. Schmidt, C.W. Pearce: J. Electrochem. Soc.128, 630 (1981)10.1149/1.2127472 ↗
7. G. Lulli: Private communication