Photoexcitation of electron-hole pairs during SIMS

journal article·1989-09

J. Kempf, M. Nonnenmacher, H. H. Wagner

Bibliographic record

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

OpenAlex topics: Ion-surface interactions and analysis · Integrated Circuits and Semiconductor Failure Analysis · Thin-Film Transistor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Show source-provided references

1. J.A. McHugh:Methods and Phenomena 1, ed. by A.W. Czanderna (Elsevier, New York 1973)

2. G. Kaus, J.E. Kempf: In Proc. 7th Int. Vac. Congr. & 3rd Int. Conf. Solid Surf., Vienna 1977, 2277

3. J. Kempf, M. Nonnenmacher, H.H. Wagner: Appl. Phys. A47, 137 (1988)10.1007/BF00618878 ↗

4. J. Kempf, H.H. Wagner:Topics Curr. Phys. 37 (Springer, Berlin, Heidelberg 1984) p. 87

5. J. Kempf, G. Kaus: Appl. Phys.13, 261 (1977)10.1007/BF00882890 ↗

6. J. Kempf: IBM Technical Report, TR 28.111, June 1 (1979)

7. Y. Homma, Y. Ishii: J. Vac. Sci. Technol. A3, 351 (1985)10.1116/1.573219 ↗

8. M. Maier, D. Bimberg, H. Baumgart, F. Phillips:SIMS. Springer Ser. Chem. Phys. Vol.19 (Springer, Berlin, Heidelberg 1981)

9. S.M. Sze:Physics of Semiconductor Devices (Wiley, New York 1981)

10. J.I. Pankove:Optical Processes in Semiconductors in Electrical Engineering Series (Prentice Hall, New Jersey 1971)

11. U.R. Behrisch (ed.):Sputtering by Particle Bombardment, Topics Appl. Phys.42 and52 (Springer, Berlin, Heidelberg 1981 and 1983)

12. F.F.Y. Wang:Impurity Doping Process in Silicon, Materials Processing Theory and Practices, Vol. 2 (North-Holland, Amsterdam 1981)

13. H.W. Werner:Thin Film and Depth Profile Analysis, Topics Curr, Phys.375 (Springer, Berlin, Heidelberg 1984)

14. J.F. Ready:Industrial Application of Lasers (Academic, New York 1978)

15. D. Baeuerle (ed.):Laser Processing and Diagnostics (Springer, Berlin, Heidelberg 1984)

16. J. Kempf: Appl. Phys. A45, 77 (1988)10.1007/BF00618767 ↗