journal article·1982-06

Supersaturated Si-As alloy formation by ion implantation and pulsed electron beam annealing

A. Turos, O. Meyer, J. Geerk

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Ion-surface interactions and analysis · Silicon and Solar Cell Technologies · Semiconductor materials and interfaces

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References (10)

Show source-provided references
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3. J. Geerk, F. Ratzel: KfK-Report 2912 (1980)
4. A. Turos, J. Geerk: Appl. Phys.22, 385 (1980)10.1007/BF00901061 ↗
5. W.K. Chu, J.W. Mayer, M.-A. Nicolet:Backscattering Spectrometry (Academic Press, New York 1978)
6. J.F. Gibbons, W.S. Johnson, S.W. Mylroie:Projected Range Statistics (Halstead Press 1975)
7. H. Kodera: Jap. J. Appl. Phys.2, 212 (1963)10.1143/JJAP.2.212 ↗
8. J.H. Barrett: Phys. Rev.B3, 1527 (1971)10.1103/PhysRevB.3.1527 ↗
9. C.W. White, B.R. Appleton, B. Stritzker, D.M. Zehner, S.R. Wilson: InLaser and Electron-Beam Solid Interactions and Material Processing, ed. by J.F. Gibbons et al. (Elsevier, North-Holland, Amsterdam 1981)
10. W.K. Chu, S.R. Mader, E. Rimini: InLaser and Electron Beam Processing of Materials, ed. by C.W. White and P.S. Peercy (Academic Press, New York 1980)