Excimer laser projection-patterned deposition of Al via photolytically driven decomposition of trialkylamine alane as adsorbate precursor
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OpenAlex topics: Optical Coatings and Gratings · Adhesion, Friction, and Surface Interactions · Laser Material Processing Techniques
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References (42)
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1. M.J. Cooke, R.A. Heinecke, R.C. Stern, J.W.C. Maes: Solid State Technol. 25, 62 (1982)
2. R.A. Levy, M.L. Green, P.K. Gallagher: J. Electrochem. Soc. 131, 2175 (1984)10.1149/1.2116043 ↗
3. M.L. Green, R.A. Levy, R.G. Nuzzo, E. Colemam: Thin Solid Films 114, 367 (1984)10.1016/0040-6090(84)90136-6 ↗
4. A. Sekiguchi, T. Kobayashi, N. Hosokawa, T. Asamaki: Jpn. J. Appl. Phys. 27, L2134 (1988)10.1143/JJAP.27.L2134 ↗
5. K.P. Cheung, C.J. Case, R. Liu, R.J. Schutz, R.S. Wagner: Proc. 7th Int'l IEEE VLSI Multilevel Interconnection Conference, Santa Clara, CA (1990) p. 30310.1109/VMIC.1990.127881 ↗
6. B.E. Bent, R.G. Nuzzo, L.H. Dubois: J. Am. Chem. Soc. 111, 1634 (1989)10.1021/ja00187a016 ↗
7. J.Y. Tsao, D.J. Ehrlich: Appl. Phys. Lett. 45, 617 (1984)10.1063/1.95331 ↗
8. G.S. Higashi, C.G. Fleming: Appl. Phys. Lett. 48, 1051 (1986)10.1063/1.96593 ↗
9. G.E. Blonder, G.S. Higashi, C.G. Fleming: Appl. Phys. Lett. 50, 766 (1987)10.1063/1.98039 ↗
10. G.S. Higashi: Chemtronics 4, 123 (1989)
11. D.A. Mantell: Appl. Phys. Lett. 53, 1387 (1988)10.1063/1.99985 ↗
12. H.W. Lee, S.D. Allen: Appl. Phys. Lett. 58, 2087 (1991)10.1063/1.105019 ↗
13. R. Bath, M.A. Koza, C.C. Chang, S.A. Schwartz: J. Cryst. Growth 77, 7 (1986)10.1016/0022-0248(86)90273-3 ↗
14. K. Tsubouchi, K. Masu, N. Shigeeda, T. Matano, Y. Hiura, N. Mikoshiba: Appl. Phys. Lett. 57, 1221 (1990)10.1063/1.103490 ↗
15. T. Cacouris, G. Scelsi, P. Shaw, R. Scarmozzino, R.M. Osgood, R.R. Krchnavek: Appl. Phys. Lett. 52, 1865 (1988)10.1063/1.99609 ↗
16. M. Hanabusa, A. Oikawa, P.Y. Cai: J. Appl. Phys. 66, 3268 (1989)10.1063/1.344119 ↗
17. M. Hanabusa, K. Sahara: Mater. Res. Soc. Symp. Proc. 201, 607 (1991)10.1557/PROC-201-607 ↗
18. W.L. Gladfelter, D.C. Boyd, K.F. Jensen: Chem. Mater. 1, 339 (1989)10.1021/cm00003a013 ↗
19. D.B. Beach, S.E. Blum, F.K. LeGoues: J. Vac. Sci. Technol. A 27, 3117 (1989)10.1116/1.576322 ↗
20. L.H. Dubois, B.R. Zegarski, C. Kao, R.G. Nuzzo: Surf. Sci. 236, 77 (1990)10.1016/0039-6028(90)90762-W ↗
21. M.E. Gross, K.P. Cheung, C.G. Fleming, J. Kovalchick, L.A. Heimbrook: J. Vac. Sci. Technol. A 9, 57 (1991)10.1116/1.577130 ↗
22. M.E. Gross, L.R. Harriot, R.L. Opila: J. Appl. Phys. 68, 4820 (1990)10.1063/1.346140 ↗
23. T.H. Baum, C.E. Larson, R.L. Jackson: Appl. Phys. Lett. 55, 1264 (1989)10.1063/1.101629 ↗
24. O. Lehmann, M. Stuke: Appl. Phys. A 53, 343 (1991)10.1007/BF00357199 ↗
25. O. Gottsleben, H.W. Roesky, M. Stuke: Adv. Mater. 3, 201 (1991)10.1002/adma.19910030407 ↗
26. T. Frugier, A. Boulahia, A. Sayah, D. Tonneau, J.E. Bour�e, J.M. Siffre, D. Mencaraglia: To be published in Appl. Surf. Sci.
27. F. Foulon, O. Lehmann, M. Stuke: To be published in Appl. Surf. Sci.
28. F. Foulon, M. Stuke: Submitted to Appl. Phys. A
29. L.H. Dubois, B.R. Zegarski, M.E. Gross, R.G. Nuzzo: Surf. Sci. 244, 89 (1991)10.1016/0039-6028(91)90172-O ↗
30. M.E. Gross, C.G. Fleming, K.P. Cheung, L.A. Heimbrook: J. Appl. Phys. 69, 2589 (1991)10.1063/1.348649 ↗
31. O. Lehmann, M. Stuke: Appl. Phys. Lett. (1992) (in press)
32. F. Foulon, M. Stuke: Submitted to Appl. Phys. Lett.
33. D.W. Squire, C.S. Dulcey, M.C. Lin: J. Vac. Sci. Technol. B 3, 1513 (1985)10.1116/1.582976 ↗
34. G.S. Higashi, L.J. Rothberg, C.G. Fleming: Chem. Phys. Lett. 115, 2771 (1986)
35. K. Domen, T.J. Chuang: Phys. Rev. Lett. 59, 1484 (1987)10.1103/PhysRevLett.59.1484 ↗
36. C.J. Chen, R.M. Osgood: Appl. Phys. A 31, 171 (1983)10.1007/BF00614950 ↗
37. C.J. Chen, R.M. Osgood: J. Chem. Phys. 81, 327 (1983)10.1063/1.447309 ↗
38. J.M. Mundenar, R. Murphy, K.D. Tsuei, E.W. Plummer: Chem. Phys. Lett. 143, 593 (1988)10.1016/0009-2614(88)87073-8 ↗
39. E. Bauer: Kristallogr. 110, 378 (1958)
40. J.A. Venables: Thin Solid Films 32, 135 (1976)10.1016/0040-6090(76)90570-8 ↗
41. J. Flicstein, J.E. Bour�e: In Photochemical Processing of Electronic Materials, ed by I.W. Boyd, R.B. Jackman (Academic, New York 1992) p. 105
42. F. Foulon, M. Green: In [41] p. 465