journal article·1993-07

Impurity distribution and electrical characteristics of boron-doped Si1?x Ge x /Si p +/N heterojunction diodes produced using pulsed UV-laser-induced epitaxy and Gas-immersion laser doping

K.-J. Kramer, S. Talwar, P. G. Carey, E. Ishida, D. Ashkenas, K. H. Weiner, T. W. Sigmon

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OpenAlex topics: Silicon and Solar Cell Technologies · Silicon Nanostructures and Photoluminescence · Thin-Film Transistor Technologies

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References (23)

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