journal article·1988-11

Film growth mechanism of photo-chemical vapor deposition

T. Inushima, N. Hirose, K. Urata, K. Ito, S. Yamazaki

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Advancements in Photolithography Techniques · Optical Coatings and Gratings · Copper Interconnects and Reliability

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References (8)

Show source-provided references
1. J.W. Peters, F.L. Gebhart, T.C. Hall: Solid State Technol.23, 121 (1980)10.1016/0038-1101(80)90146-X ↗
2. P.K. Boyer, C.A. Moore, R. Solanki, W.K. Ritchie, G.A. Roche, G.J. Collins: Mat. Res. Soc. Symp. Proc.17, 119 (1983)10.1557/PROC-17-119 ↗
3. K. Yano, S. Tanimura, T. Ueda, T. Fujita: 1987 Symposium on VLSI Techl, May 1987, Karuizawa, Business Center for Academic Soc. Japan, p. 71 (IEEE CAT. No. 87)
4. N. Hirose, T. Inushima, K. Urata, T. Sato, S. Yamazaki: 172nd Meeting of the Electrochemical Society Inc., Honolulu, Hawaii, 1987
5. T. Inushima, N. Hirose, K. Urata, T. Sato, S. Yamazaki: 172nd Meeting of the Electrochemical Society Inc., Honolulu, Hawaii, 1987
6. M. Janai: Thin Solid Films91, 211 (1982)10.1016/0040-6090(82)90110-9 ↗
7. W.F. Berg: Proc. R. Soc. A164, 79 (1938)10.1098/rspa.1938.0006 ↗
8. A. Ookawa: Crystal Growth (Syokabo, Tokyo 1973) p. 192 (in Japanese)