Image displacement sensing (NDSE) for achieving overlay alignment
Source abstract
Abstract
In this paper we discuss the application of NDSE [1] (Hewlett Packard’s nanoscale displacement sensing and estimation technology) as an overlay metrology tool. We describe a method where nanoscale displacement sensing forms the basis of a precision alignment measurement. We will then provide a review of experiments performed to assess the accuracy of one particular NDSE algorithm, tracking silicon targets as they translate on a piezoelectric stage under an optical microscope. We conclude by describing upcoming experiments which will incorporate NDSE as an alignment sensor in a nanoimprint lithography application.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Force Microscopy Techniques and Applications · Advanced Surface Polishing Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (39)
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