journal article·1984-04

Photo-enhanced etching ofn-Si

H. J. Hoffmann, J. M. Woodall

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Silicon Nanostructures and Photoluminescence · Nanowire Synthesis and Applications · Thin-Film Transistor Technologies

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References (11)

Show source-provided references
1. W. Kern, Ch.A. Deckert: Chemical Etching, inThin Film Processes, ed. by J.L. Vossen and W. Kern (Academic Press, New York 1978) pp. 401?49610.1016/B978-0-12-728250-3.50015-5 ↗
2. B. Schwartz, H. Robbins: J. Electrochem. Soc.123, 1903 (1976)10.1149/1.2132721 ↗
3. W. Kern: RCA Rev.39, 278 (1978)
4. S.M. Hu, D.R. Kerr: J. Electrochem. Soc.114, 414 (1967)10.1149/1.2426612 ↗
5. A. Uhlir: Bell Syst. Tech. J.35, 333 (1956)10.1002/j.1538-7305.1956.tb02385.x ↗
6. D.R. Turner: J. Electrochem. Soc.105, 402 (1958)10.1149/1.2428873 ↗
7. D.R. Turner: J. Electrochem. Soc.107, 810 (1960)10.1149/1.2427519 ↗
8. D.R. Turner:The Surface Chemistry of Metals and Semiconductors (J. Wiley, New York 1960)
9. R. Memming, G. Schwandt: Surf. Sci.4, 109 (1966)10.1016/0039-6028(66)90071-9 ↗
10. R.L. Meek: J. Electrochem. Soc.118, 437 (1971)10.1149/1.2408076 ↗
11. H.J. Hoffmann, J.M. Woodall, T.I. Chappell: Appl. Phys. Lett.38, 564 (1981)10.1063/1.92414 ↗