journal article·1988-01

Optical absorptivity of ion-beam irradiated silicon

K. L. Bhatia, W. Kr�tschmer, S. Kalbitzer

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies

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References (14)

Show source-provided references
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2. L. Ley: InThe Physics of Hydrogenated Amorphous Silicon II, ed. by J. D. Joannopoulos and G. Lucovski, Topics Appl. Phys.57 (Springer, Berlin, Heidelberg 1984) p. 144 and references therein
3. S. Kalbitzer: Appl. Phys. A44, 153?155 (1987)10.1007/BF00626416 ↗
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7. G.D. Cody: InSemiconductors and Semimetals, Vol.21 B, ed. by J.I. Pankove (Academic, Orlando 1984) p. 11 and references therein
8. I. Tauc: Mat. Res. Bull.5, 721 (1970)10.1016/0025-5408(70)90112-1 ↗
9. L. Ley: InPoly-, Micro-Crystalline and Amorphous Semiconductors, ed. by P. Pinard, and S. Kalbitzer (Les Éditions de Physique, Les Ulis 1984) p. 451
10. P.J. Zanzucchi, C.R. Wronski, D.E. Carlson: J. Appl. Phys.48, 5227 (1977)10.1063/1.323553 ↗
11. M.H. Brodsky, R.S. Title, K. Weiser, G.D. Pettit: Phys. Rev.B 1, 2632 (1970)10.1103/PhysRevB.1.2632 ↗
12. M. Janai, F. Moser: J. Appl. Phys.53, 1385 (1982)10.1063/1.330631 ↗
13. E.C. Freeman, W. Paul: Phys. Rev. B20, 716 (1979)10.1103/PhysRevB.20.716 ↗
14. K.L. Bhatia, W. Krätschmer, S. Kalbitzer: To be published