XeCl laser controlled chemical etching of aluminum in chlorine gas
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OpenAlex topics: Semiconductor materials and devices · Laser Material Processing Techniques · Silicon Nanostructures and Photoluminescence
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References (19)
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1. R. Srinivasan, V. Mayne-Banton: Appl. Phys. Lett.41, 576 (1982)10.1063/1.93601 ↗
2. J.E. Andrew, P.E. Dyer, D. Forster, P.H. Key: Appl. Phys. Lett.43, 717 (1983)10.1063/1.94488 ↗
3. G. Koren, J.T.C. Yeh: Appl. Phys. Lett.44, 1112 (1984)10.1063/1.94661 ↗
4. G. Koren, J.T.C. Yeh: J. Appl. Phys.56, 2120 (1984)10.1063/1.334211 ↗
5. G. Koren: Appl. Phys. Lett.45, 10 (1984)10.1063/1.95005 ↗
6. J.E. Andrew, P.E. Dyer, R.D. Greenough, P.H. Key: Appl. Phys. Lett.43, 1076 (1983)10.1063/1.94204 ↗
7. J.E. Rothenberg, G. Koren: Appl. Phys. Lett.44, 664 (1984)10.1063/1.94870 ↗
8. R.J. Von Gutfeld, R.E. Acosta, L.T. Romankiw: IBM J. Res. Develop.26, 136 (1982)10.1147/rd.262.0136 ↗
9. J.Y. Tsao, D.J. Ehrlich: Appl. Phys. Lett.43, 146 (1983)10.1063/1.94285 ↗
10. D.J. Ehrlich, R.M. Osgood, Jr., T.F. Deutsch: Appl. Phys. Lett.38, 1018 (1981) and38, 399 (1981)10.1063/1.92228 ↗
11. T.J. Chuang: IBM J. Res. Develop.26, 145 (1982)10.1147/rd.262.0145 ↗
12. T.J. Chuang: Conf. Lasers and Electro Optics, Anaheim, CA (1984) p. 186
13. T. Arikado, M. Sekine, H. Okano, Y. Horiike: Mat. Res. Soc. Symp. Proc.29, 167 (1984), and Toshiba Corp. Dry Etching Patents JPN 80/164313,4. 11218010.1557/PROC-29-167 ↗
14. P. Brewer, S. Halle, R.M. Osgood, Jr.: Appl. Phys. Lett.45, 475 (1984)10.1063/1.95221 ↗
15. G. Koren, F. Ho, J.J. Ritsko: Appl. Phys. Lett.46, 1006 (1985)10.1063/1.95815 ↗
16. L. Reimer:Scanning Electron Microscopy, Springer Ser. Opt. Sci.45 (Springer, Berlin, Heidelberg 1985)10.1007/978-3-662-13562-4 ↗
17. J.F. O'Hanlon:A User's Guide to Vacuum Technology (Wiley, New York 1980)
18. CRC Handbook of Chemistry and Physics (CRC Press)
19. T.G. Dune, N.W. Gregory: J. Am. Chem. Soc.80, 1526 (1958)10.1021/ja01540a002 ↗