journal article·1993-12

Bistable growth in laser chemical vapor deposition

P. B. Kargl, R. Kullmer, D. B�uerle

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · Silicon and Solar Cell Technologies

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References (9)

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1. D. Bäuerle: Chemical Processing with Lasers, Springer Ser. Mater. Sci., Vol. 1 (Springer, Berlin, Heidelberg 1986)10.1007/978-3-662-02505-5 ↗
2. P.B. Kargl, R. Kullmer, D. Bäuerle: Appl. Phys. A 57, 175 (1993)10.1007/BF00331441 ↗
3. T. Szörényi, G.Q. Zhang, Y.C. Du, R. Kullmer, D. Bäuerle: In Laser Processing and Diagnostics II, ed. by D. Bäuerle, K.L. Kompa, L.D. Laude (Les Editions de Physique, Les Ulis 1986) p. 91
4. R.B. Jackman, J.S. Foord, A.E. Adams, M.L. Lloyd: J. Appl. Phys. 59, 2031 (1986)10.1063/1.336385 ↗
5. D. Braichotte, H. van den Bergh: Appl. Phys. A 44, 353 (1987)10.1007/BF00624603 ↗
6. S. Preuß, H. Stafast: Appl. Phys. A 54, 152 (1992)10.1007/BF00323902 ↗
7. J. Messelhäuser, E.B. Flint, H. Suhr: Appl. Phys. A 55, 196 (1992)10.1007/BF00334223 ↗
8. F. Foulon, M. Stuke: Appl. Phys. A 56, 283 (1993)10.1007/BF00539488 ↗
9. G. Reisse, F. Gänsicke, A. Fischer, H. Johansen: Appl. Surf. Sci. 69, 412 (1993)10.1016/0169-4332(93)90544-L ↗