journal article·1988-04

248 nm laser etching of GaAs in chlorine and ozone gas environments

G. Koren, J. E. Hurst

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Laser Material Processing Techniques · Laser Design and Applications · Laser-induced spectroscopy and plasma

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (13)

Show source-provided references
1. M. Takai, J. Tokuda, H. Nakai, K. Gamo, S. Numba: Jpn. J. Appl. Phys.22, L 757 (1983);23, L 852 (1984)10.1143/JJAP.22.L757 ↗
2. M. Takai, J. Tokuda, H. Nakai, K. Gamo, S. Namba: InLaser Controlled Chemical Processing of Surfaces, ed. by A.W. Johnson, D.J. Ehrlich (North-Holland, New York 1984)
3. C.I.H. Ashby: Appl. Phys. Lett.45, 892 (1984)10.1063/1.95404 ↗
4. C.I.H. Ashby: Appl. Phys. Lett.46, 752 (1985)10.1063/1.95496 ↗
5. P. Brewer, S. Halle, R.M. Osgood Jr.: Appl. Phys. Lett45, 475 (1984)10.1063/1.95221 ↗
6. P.D. Brewer, D. McClure, R.M. Osgood Jr.: Appl. Phys. Lett.47, 3104 (1985)10.1063/1.96202 ↗
7. P.D. Brewer, D. McClure, R.M. Osgood Jr.: Appl. Phys. Lett.49, 803 (1986)10.1063/1.97552 ↗
8. H. Okano, Y. Horiike, M. Sekine: Jpn. J. Appl. Phys.24, 68 (1985)10.1143/JJAP.24.68 ↗
9. G. Koren, F. Ho, J.J. Ritsko: Appl. Phys. Lett.46, 1006 (1985); Appl. Phys. A40, 13 (1986)10.1063/1.95815 ↗
10. M.G. Griggs: J. Chem. Phys.49, 857 (1968)10.1063/1.1670152 ↗
11. I.J. Bigio, S.J. Thomas: Appl. Phys. Lett.49, 989 (1986)10.1063/1.97467 ↗
12. A. Pospieszczyk, M.A. Harith, B. Stritzker: J. Appl. Phys.54, 3176 (1983) and references therein10.1063/1.332476 ↗
13. G. Koren: Appl. Phys. Lett.50, 1030 (1987)10.1063/1.97960 ↗