248 nm laser etching of GaAs in chlorine and ozone gas environments
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OpenAlex topics: Laser Material Processing Techniques · Laser Design and Applications · Laser-induced spectroscopy and plasma
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References (13)
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1. M. Takai, J. Tokuda, H. Nakai, K. Gamo, S. Numba: Jpn. J. Appl. Phys.22, L 757 (1983);23, L 852 (1984)10.1143/JJAP.22.L757 ↗
2. M. Takai, J. Tokuda, H. Nakai, K. Gamo, S. Namba: InLaser Controlled Chemical Processing of Surfaces, ed. by A.W. Johnson, D.J. Ehrlich (North-Holland, New York 1984)
3. C.I.H. Ashby: Appl. Phys. Lett.45, 892 (1984)10.1063/1.95404 ↗
4. C.I.H. Ashby: Appl. Phys. Lett.46, 752 (1985)10.1063/1.95496 ↗
5. P. Brewer, S. Halle, R.M. Osgood Jr.: Appl. Phys. Lett45, 475 (1984)10.1063/1.95221 ↗
6. P.D. Brewer, D. McClure, R.M. Osgood Jr.: Appl. Phys. Lett.47, 3104 (1985)10.1063/1.96202 ↗
7. P.D. Brewer, D. McClure, R.M. Osgood Jr.: Appl. Phys. Lett.49, 803 (1986)10.1063/1.97552 ↗
8. H. Okano, Y. Horiike, M. Sekine: Jpn. J. Appl. Phys.24, 68 (1985)10.1143/JJAP.24.68 ↗
9. G. Koren, F. Ho, J.J. Ritsko: Appl. Phys. Lett.46, 1006 (1985); Appl. Phys. A40, 13 (1986)10.1063/1.95815 ↗
10. M.G. Griggs: J. Chem. Phys.49, 857 (1968)10.1063/1.1670152 ↗
11. I.J. Bigio, S.J. Thomas: Appl. Phys. Lett.49, 989 (1986)10.1063/1.97467 ↗
12. A. Pospieszczyk, M.A. Harith, B. Stritzker: J. Appl. Phys.54, 3176 (1983) and references therein10.1063/1.332476 ↗
13. G. Koren: Appl. Phys. Lett.50, 1030 (1987)10.1063/1.97960 ↗