The appearance of spatially nonuniform temperature distributions during rapid thermal processing
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OpenAlex topics: Material Properties and Applications · Engineering Technology and Methodologies · Solidification and crystal growth phenomena
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References (8)
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1. R. Kakoschke, E. Bußmann, H. Föll: To be published in Appl. Phys. A (1990)
2. P. Vandenabeele, K. Maex: To be published in: Proceedings of the SPIE-Symposium on Rapid Isothermal Processing (12, 13 October 1989) ed. by R. Singh, Vol. 118910.1117/12.963962 ↗
3. R. Kakoschke: Nucl. Instrum. Methods B 37/38, 753 (1989) (Proceedings of the 8th International Conference on Ion Implantation and Technology)10.1016/0168-583X(89)90292-9 ↗
4. S. Wurm, P. Alpern, D. Savignac, R. Kakoschke: Appl. Phys. A 47, 147 (1988)10.1007/BF00618879 ↗
5. S. Mehta, D. Hodul: In Rapid Thermal Processing of Electronic Materials, ed. by S.R. Wilson, R. Powell, D.E. Davies (MRS Symp. Proc., Pittsburgh 1987) p. 95
6. H.J. Böhm, H. Kabza, T.F. Meister, H. Wendt: In ULSI Science and Technology 1987, ed. by S. Broydo, C.M. Osburn (PV 1987/11) p. 347
7. G. Bentini, L. Correra, C. Donolato: J. Appl. Phys. 56, 2922 (1984)10.1063/1.333832 ↗
8. P. Kücher, F. Fuchs: Private communication