journal article·1984-03

Direct high-resolution excimer laser photoetching

S. Rice, K. Jain

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Advancements in Photolithography Techniques · Semiconductor materials and devices · Nanofabrication and Lithography Techniques

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References (6)

Show source-provided references
1. B.J. Lin: J. Vac. Sci. Tech.12, 1317 (1975)10.1116/1.568527 ↗
2. K. Jain, C.G. Willson, B.J. Lin: IEEE EDL-3, 53 (1982); IBM J. Res. Dev.26, 151 (1982)10.1109/EDL.1982.25476 ↗
3. R. Srinivasan, W.J. Leigh: J. Am. Chem. Soc.104, 6784 (1982)10.1021/ja00388a052 ↗
4. R. Srinivasan, V. Mayne-Banton: Appl. Phys. Lett.41, 576 (1982)10.1063/1.93601 ↗
5. J. Andrew, P. Dyer, R. Greenough, P. Key: Conf. Lasers and Electro-Optics, Baltimore, MD (1983)
6. K. Jain, S.L. Rice, R. Moore: IBM Tech. Disc. Bull. (to appear)