Electronic structure of two coupled Si δ-doped GaAs as dependent on the donor thickness
Source abstract
Abstract
For the uniform distribution we have theoretically investigated the influence of donor thickness on two coupled Si δ-doped GaAs structure, at T=0 K. Electronic structure have been calculated by solving the Schrodinger and Poisson equations self-consistently. We thus find the confining potential, the electronic density, the subband energies and their eigen envelope functions, the subband occupations and Fermi energy. From the self-consistent calculation, we have seen that the effective potential profile and the electronic density of two coupled Si δ-doped GaAs structure are sensitive to the donor thickness while the subband energies and the subband occupations are not sensitive to the donor thickness .
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Research context
OpenAlex topics: Semiconductor Quantum Structures and Devices · Quantum and electron transport phenomena · Surface and Thin Film Phenomena
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References (26)
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1. E.F. Schubert, A. Fischer, K. Ploog: IEEE Trans. Electron Dev. 33, 625 (1986)10.1109/T-ED.1986.22543 ↗
2. K. Ploog, M. Hauser, A. Fischer: Appl. Phys. A 45, 233 (1988)10.1007/BF00615010 ↗
3. A.C. Maciel, M. Tatham, J.F. Ryan, J.M. Worlock, R.E. Nahory, J.P. Harbison, L.T. Florez: Surf. Sci. 228, 251 (1990)10.1016/0039-6028(90)90303-P ↗
4. L. Ioriatti: Phys. Rev. B 41, 8340 (1990)10.1103/PhysRevB.41.8340 ↗
5. J.C. Egues, J.C. Barbosa, A.C. Notari, P. Basmaji, L. Ioriatti: J. Appl. Phys. 70, 3678 (1991)10.1063/1.349215 ↗
6. M.H. Degani: Phys. Rev. B 44, 5580 (1991)10.1103/PhysRevB.44.5580 ↗
7. M.H. Degani: J. Appl. Phys. 70, 4362 (1991)10.1063/1.349117 ↗
8. M.L. Ke, J.S. Rimmer, B. Hamilton, J.H. Evan, M. Missious, K.E. Singer, P. Zalm: Phys. Rev. B 45, 14114 (1992)10.1103/PhysRevB.45.14114 ↗
9. M.L. Ke, J.S. Rimmer, B. Hamilton, M. Missious, B. Khamsehpour, J.H. Evans, K.E. Singer, P. Zalm: Surf. Sci. 267, 65 (1992)10.1016/0039-6028(92)91090-X ↗
10. S.M. Shibli, L.M. Scolfaro, J.R. Leite, C. A. C. Mendonça, F. Plentz, A. Meneses: Appl. Phys. Lett. 60, 2895 (1992)10.1063/1.106811 ↗
11. E. Ozturk, Y. Ergun, H. Sari, I. Sokmen: Superlattices Microstruct. 28, 35 (2000)10.1006/spmi.2000.0848 ↗
12. E. Ozturk, Y. Ergun, H. Sari, I. Sokmen: Semicond. Sci. Tech. 16, 421 (2001)10.1088/0268-1242/16/6/301 ↗
13. E. Ozturk, Y. Ergun, H. Sari, I. Sokmen: Appl. Phys. A 73, 749 (2001)10.1007/s003390100857 ↗
14. E. Ozturk, Y. Ergun, H. Sari, I. Sokmen: J. Appl. Phys. 91, 2118 (2002)10.1063/1.1424051 ↗
15. A. Ben Jazia, H. Mejri, H. Maaref, K. Souissi: Semicond. Sci. Tech. 12, 1388 (1997)10.1088/0268-1242/12/11/010 ↗
16. K. Ploog: J. Cryst. Growth 81, 304 (1987)10.1016/0022-0248(87)90409-X ↗
17. C.Y. Chang, W. Lin, W.C. Hsu, T.S. Wu, S.Z. Chang, C. Wang: Jpn. J. Appl. Phys. 30, 1158 (1991)10.1143/JJAP.30.1158 ↗
18. T.Y. Kuo, J.E. Cunningham, E.F. Schubert, W.T. Tsang, T.H. Chiu, F. Run, C.G. Fonstad: J. Appl. Phys. 64, 3324 (1988)10.1063/1.341513 ↗
19. E.F. Schubert, J.E. Cunningham, W.T. Tsang: Solid State Commun. 63, 591 (1987)10.1016/0038-1098(87)90859-3 ↗
20. G. Gillman, B. Vinter, E. Barbier, A. Tardella: Appl. Phys. Lett. 52, 972 (1988)10.1063/1.99245 ↗
21. X. Zheng, T.K. Carns, K.L. Wang, B. Wu: Appl. Phys. Lett. 62, 504 (1993)10.1063/1.108893 ↗
22. P.M. Koenraad, A.C.L. Heessels, F.A.P. Blom, J.A.A.J. Perenboom, J.H. Wolter: Physica B 184, 221 (1993)
23. T.K. Carns, X. Zheng, K.L. Wang: Appl. Phys. Lett. 62, 3455 (1993)10.1063/1.109047 ↗
24. H.H. Radamson, M.R. Sardela, O. Nur Jr., M. Willander, B.E. Sernelius, W.X. Ni, G.V. Hansson: Appl. Phys. Lett. 64, 1842 (1994)10.1063/1.111773 ↗
25. G.Q. Hai, N. Studart, F.M. Peeters: Phys. Rev. B 52(15), 11273 (1995)10.1103/PhysRevB.52.11273 ↗
26. P.M. Koenraad, F.A.P. Blom, C.J.G.M. Langerak, M.R. Leys, J.A.A.J. Perenboom, J. Singleton, S.J.R.M. Spermon, W.C. Van der Vleuten, A.P.J. Voncken, J.H. Wolter: Semicond. Sci. Tech. 5, 861 (1990)10.1088/0268-1242/5/8/010 ↗