Photochemical etching of GaAs with Cl2 induced by synchrotron radiation
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Electron and X-Ray Spectroscopy Techniques · Semiconductor materials and devices · Photocathodes and Microchannel Plates
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (55)
Show source-provided references
1. M. Hirose: Photon, Beam and Plasma Assisted Processing, ed. by I.W. Boyd, E.F. Krimmel (Elsevier, New York 1989) p. xvii
2. T. Nozaki, A. Higashisaka: Very High Speed Integrated Circuits: Gallium Arsenide LSI, ed. by T. Ikoma, Semicond. Semimet. 29, 97 (1990)10.1016/S0080-8784(08)60094-0 ↗
3. M.W. Geis, N.N. Efremow, S.W. Pang, A.C. Anderson: J. Vac. Sci. Technol. B 5, 363 (1987)10.1116/1.583903 ↗
4. N.G. Einspruch, D.M. Brown: Plasma Processing for VLSI, VLSI Electron. Microstructure Sci. 8 (Academic, New York 1984)
5. Y. Horiike, H. Okano, M. Shibagaki: Conference on Microcircuits Engineering, Grenoble (1982)
6. M.C. Shih, M.B. Freiler, G. Haase, R. Scarmozzino, R.M. Osgood, Jr.: Appl. Phys. Lett. 61(7), 828 (1992)10.1063/1.107758 ↗
7. S. Affrossman, R.T. Bailey, C.H. Cramer, F.R. Cruickshank, J.M.R. MacAllister, J. Alderman: Appl. Phys. A 49, 533 (1989)10.1007/BF00617021 ↗
8. D. Bäuerle: Chemical Processing with Lasers, Springer Ser. Mater. Sci., vol. 1 (Springer, Berlin, Heidelberg 1986)10.1007/978-3-662-02505-5 ↗
9. T.J. Chuang: J. Vac. Sci. Technol. 21(3), 798 (1982)10.1116/1.571827 ↗
10. D.J. Ehrlich, R.M. Osgood, Jr., T.F. Deutsch: Appl. Phys. Lett. 38(12), 1018 (1981)10.1063/1.92228 ↗
11. V. Liberman, G. Haase, R.M. Osgood, Jr.: J. Chem. Phys. 96(2), 1590 (1992)10.1063/1.462143 ↗
12. G. Koren, J.E. Hurst, Jr.: Appl. Phys. A 45, 301 (1988)10.1007/BF00617935 ↗
13. N. Hayasaka, A. Hiraya, K. Shobatake: Jpn. J. Appl. Phys. 26(7), L1110 (1987)10.1143/JJAP.26.L1110 ↗
14. K. Shobatake, H. Ohashi, K. Fukui, A. Hiraya, N. Hayasaka, H. Okano, A. Yoshida, H. Kume: Appl. Phys. Lett. 56(22), 2189 (1990)10.1063/1.103241 ↗
15. S. Terakado, J. Nishino, M. Morigami, M. Harada, S. Suzuki, K. Tanaka, J. Chikawa: Jpn. J. Appl. Phys. 29(5), L709 (1990)10.1143/JJAP.29.L709 ↗
16. H. Kyuragi, T. Urisu: Appl. Phys. Lett. 50(18), 1254 (1987)10.1063/1.97926 ↗
17. T. Urisu, H. Kyuragi: J. Vac. Sci. Technol. B 5(5), 1436 (1987)10.1116/1.583837 ↗
18. B. Li, I. Twesten, N. Schwentner: Appl. Phys. A 56, 355 (1993)10.1007/BF00324356 ↗
19. A. Ludviksson, M. Xu, R.M. Martin: Surf. Sci. 277, 282 (1992)10.1016/0039-6028(92)90769-3 ↗
20. S.M. Mokler, P.R. Watson, L. Ungier, J.R. Arthur: J. Vac. Sci. Technol. B 10, 2371 (1992)10.1116/1.586070 ↗
21. T. Ohno: Phys. Rev. B 44, 8387 (1991);10.1103/PhysRevB.44.8387 ↗
22. Phys. Rev. Lett. 70, 962 (1993)10.1103/PhysRevLett.70.962 ↗
23. L.A. Delouise: J. Vac. Sci. Technol. A 9, 1732 (1991)10.1116/1.577495 ↗
24. L.A. Delouise: J. Chem. Phys. 94, 1528 (1991)10.1063/1.460011 ↗
25. L.A. Delouise: Surf. Sci. Lett. 244, L87 (1991)10.1016/0167-2584(91)90723-5 ↗
26. K. Wong, E.A. Ogryzlo: J. Vac. Sci. Technol. B 10, 668 (1992)10.1116/1.586430 ↗
27. J.H. Ha, E.A. Ogryzlo, S. Polyhronopoulos: J. Chem. Phys. 89, 2844 (1988)10.1063/1.454988 ↗
28. N. Furuhata, H. Miyamoto, A. Okamoto, K. Ohata: J. Appl. Phys. 65, 168 (1989)10.1063/1.342564 ↗
29. H. Hou, Z. Zhang, S. Chen, C. Su, W. Yan, M. Vernon: Appl. Phys. Lett. 55, 801 (1989)10.1063/1.101764 ↗
30. M. Balooch, D.R. Olander, W.J. Siekhaus: J. Vac. Sci. Technol. B 4, 794 (1986)10.1116/1.583558 ↗
31. S. Sugata, K. Asakawa: J. Vac. Sci. Technol. B 5, 894 (1987)10.1116/1.583686 ↗
32. F. Shimokawa, H. Tanaka, Y. Uenishi, R. Sawada: J. Appl. Phys. 66, 2613 (1989)10.1063/1.344228 ↗
33. H. Watanabe, S. Matsui: Jpn. J. Appl. Phys. 30, 3190 (1991)10.1143/JJAP.30.3190 ↗
34. M.R. Berman: Appl. Phys. A 53, 442 (1991)10.1007/BF00348160 ↗
35. V. Libermann, G. Haase, R.M. Osgood, Jr.: Chem. Phys. Lett. 176, 379 (1991)10.1016/0009-2614(91)90047-D ↗
36. E. Lax: Taschenbuch für Chemiker und Physiker (Springer, Berlin, Heidelberg, 1967) pp. 1?217, 1?343
37. P. Mogyorosi, K. Piglmayer, R. Kullmer, D. Bäuerle: Appl. Phys. A 45, 293 (1988)10.1007/BF00617934 ↗
38. E. Hasselbrink: Appl. Phys. A 53, 403 (1991)10.1007/BF00348152 ↗
39. S.K. So, W. Ho: Appl. Phys. A 47, 213 (1988)
40. C.F. Yu, M.T. Schmidt, D.V. Podlesnik, H.H. Gilgen, R.M. Osgood, Jr.: J. Vac. Sci. Technol. B 5, 1087 (1987)
41. L.C. Lee, M. Suto: J. Chem. Phys. 84, 5277 (1986)10.1063/1.449937 ↗
42. M.V. Kurepa, D.S. Belic: Chem. Phys. Lett. 749, 608 (1977)10.1016/0009-2614(77)87050-4 ↗
43. D.L. McCorkle, A.A. Christodoulides, L.G. Christophorou: Chem. Phys. Lett. 109, 276 (1984)10.1016/0009-2614(84)85734-6 ↗
44. J.S. Blakemore: Gallium Arsenide, ed. by J.S. Blakemore, vol. 1 (AIP, New York 1987) p. 30
45. P.E. Gregory, W.E. Spicer: Phys. Rev. B 13, 725 (1976)10.1103/PhysRevB.13.725 ↗
46. H. Okabe: Photochemistry of Small Molecules (Wiley, New York 1978) p. 185
47. C. Roxlo, A. Mandl: J. Appl. Phys. 51, 2969 (1980)10.1063/1.328108 ↗
48. J. Wörmer, T. Möller, J. Stapelfeldt, G. Zimmerer, D. Haaks, S. Kampf, J. Le Calvé, M.-C. Castex: Z. Phys. D 7, 383 (1988)
49. S.D. Peyerimhoff, R.J. Buenker: Chem. Phys. 57, 279 (1981)10.1016/0301-0104(81)80208-X ↗
50. P. Gürtler, H. Kunz, J. Le Calvé: J. Chem. Phys. 91, 6020 (1989)10.1063/1.457419 ↗
51. J.G. McCaffrey, H. Kunz, N. Schwentner: J. Chem. Phys. 96, 2825 (1992)10.1063/1.461979 ↗
52. N. Cabrera, N.F. Mott: Rep. Progr. Phys. 12, 163 (1949)10.1088/0034-4885/12/1/308 ↗
53. J.G. McCaffrey, H. Kunz, N. Schwentner: J. Chem. Phys. 96, 155 (1992)10.1063/1.462885 ↗
54. R. Alimi, R.B. Gerber, J.G. McCaffrey, H. Kunz, N. Schwentner: Phys. Rev. Lett. 69, 856 (1992)10.1103/PhysRevLett.69.856 ↗
55. B. Demerican, W. Brockner: Z. Naturforsch. A 38, 811 (1983)10.1515/zna-1983-0717 ↗