journal article·2004-04

Enhanced luminescence in ZnGa2O4-xSx:Mn2+ thin-film phosphors grown on MgO(100) substrate

J.S. Bae, Y.H. Kim, J.K. Jang, K.S. Shim, J.K. Lee, J.H. Jeong, S.S. Yi, H.L. Park

Applied Physics A· Volume 78· Issue 7
Publisher page

Abstract

Mn-doped ZnGa2O4-xSx thin-film phosphors have been grown using a pulsed laser deposition technique at varying growth conditions. Structural characterization was carried out on a series of ZnGa2O4-xSx:Mn2+ films grown on MgO(100) substrates using Zn-rich ceramic targets. Oxygen pressure was fixed at 100 mTorr and substrate temperatures were varied from 500 to 700 °C. The results of X-ray-diffraction patterns showed that the lattice constants of the ZnGa2O3.95S0.05:Mn2+ thin films decrease with the substitution of sulfur for the oxygen in ZnGa2O4. Measurements of photoluminescence (PL) properties of ZnGa2O4-xSx:Mn2+ thin films have indicated that MgO(100) is one of the most promising substrates for the growth of high-quality ZnGa2O4-xSx:Mn2+ thin films. In particular, the incorporation of sulfur into the ZnGa2O4 lattice could induce a remarkable increase of PL. The highest green-emission intensity was observed with ZnGa2O3.95S0.05:Mn2+ films, whose brightness was increased by a factor of 3.5 in comparison with that of ZnGa2O4:Mn2+ films. This phosphor may be promising for application to flat-panel displays.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Luminescence Properties of Advanced Materials · Ga2O3 and related materials · Inorganic Fluorides and Related Compounds

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (17)

Show source-provided references
1. I.K. Jeong, H.L. Park, S.I. Mho: Solid State Commun. 108, 823 (1998)10.1016/S0038-1098(98)00456-6 ↗
2. S.K. Choi, H.S. Moon, S.I. Mho, T.W. Kim, H.L. Park: Mater. Res. Bull. 33, 693 (1998)10.1016/S0025-5408(98)00024-5 ↗
3. L.E. Shea, R.K. Datta, J.J. Brown, Jr.: J. Electrochem. Soc. 141, 2198 (1994)10.1149/1.2055086 ↗
4. S.H.M. Poort, D. Cetin, A. Meijerink, G. Blasse: J. Electrochem. Soc. 144, 2179 (1994)10.1149/1.1837761 ↗
5. S. Itoh, H. Toki, Y. Sato, K. Morimoto, T. Kishino: J. Electrochem. Soc. 138, 1509 (1991)10.1149/1.2085816 ↗
6. I.K. Jeong, H.L. Park, S.I. Mho: Solid State Commun. 105, 179 (1998)10.1016/S0038-1098(97)10101-6 ↗
7. O. Kanehisa, T. Kano, H. Yamamoto: J. Electrochem. Soc. 132, 2023 (1985)10.1149/1.2114274 ↗
8. S.Y. Chang, C.I. Jeon, C.H. Pyon, Q.W. Choi, C.H. Kim, S.I. Mho: Bull. Korea Chem. Soc. 11, 386 (1990)
9. T. Minami, T. Macno, Y. Kuroi, S. Dakata: Jpn. J. Appl. Phys. Part 2 34, L684 (1995)10.1143/JJAP.34.L684 ↗
10. I.J. Hsieh, M.S. Feng, K.T. Kuo, P. Lin: J. Electrochem. Soc. 141, 1618 (1994)10.1149/1.2054971 ↗
11. Z. Yan, M. Koike, H. Takei: J. Cryst. Growth 165, 183 (1996)10.1016/0022-0248(96)00183-2 ↗
12. T. Minami, Y. Kuroi, S. Dakata: J. Vac. Sci. Technol. A 14, 1736 (1996)10.1116/1.580329 ↗
13. Y.E. Lee, D.P. Norton, J.D. Budai: Appl. Phys. Lett. 74, 3155 (1999)10.1063/1.124095 ↗
14. G.A. Hirata, J. Mckittrick, M. Avalos-Borja, J.M. Siqueiros, D. Devlin: Appl. Surf. Sci. 113–114, 509 (1997)10.1016/S0169-4332(96)00829-X ↗
15. W. Schiossel, W. Potzel, H. Karzel, M. Steiner, M. Köfferlein, G.M. Kalvius, M. Metzer, G. Dietzmann, A. Martin, I. Halevy, J. Gal, W. Schäfer, W. Gill, D.W. Mitchell, T.P. Das: Hyperfine Interact. 90, 359 (1994)10.1007/BF02069139 ↗
16. Y.E. Lee, D.P. Norton, J.D. Budai, C.M. Rouleau, J.W. Park: J. Electroceram. 4, 293 (2000)10.1023/A:1009946105898 ↗
17. C.F. Yu, P. Lin: J. Appl. Phys. 79, 7191 (1996)10.1063/1.361435 ↗