Improving metal-enhanced photoluminescence by micro-pattern of metal nanoparticles: a case study of Ag–ZnCdO system
Source abstract
Abstract
Micro-pattern of Ag nanoparticles and Ag film is inserted between ZnCdO film and the substrate to enhance the photoluminescence (PL) of ZnCdO films, achieving enhancement ratio of 21.2 and 7.1, respectively. Time-resolved photoluminescence shows that the PL lifetime of Ag/ZnCdO films is longer than that of bare ZnCdO, which is attributed to surface modification and surface plasmons coupling. The improved enhancement in the sample with Ag pattern is attributed to the fact that periodic Ag structure offers additional scattering mediums and thus increases the light extraction efficiency.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: ZnO doping and properties · Copper-based nanomaterials and applications · Quantum Dots Synthesis And Properties
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References (26)
Show source-provided references
1. F.Z. Wang, Z.Z. Ye, D.W. Ma, L.P. Zhu, F. Zhuge, J. Cryst. Growth 283, 373 (2005)10.1016/j.jcrysgro.2005.05.063 ↗
2. D.K. Hwang, S.H. Kang, J.H. Lim, E.J. Yang, J.Y. Oh, J.H. Yang, S.J. Park, Appl. Phys. Lett. 86, 222101 (2005)10.1063/1.1940736 ↗
3. A. Tsukazaki, A. Ohtomo, T. Onuma, M. Ohtani, T. Makino, M. Sumiya, K. Ohtani, S.F. Chichibu, S. Fuke, Y. Segawa, H. Ohno, H. Koinuma, M. Kawasaki, Nat. Mater. 4, 42 (2004)10.1038/nmat1284 ↗
4. S. Nakamura, Semicond. Sci. Technol. 14, R27 (1999)10.1088/0268-1242/14/6/201 ↗
5. M.K. Kwon, J.Y. Kim, B.H. Kim, I.K. Park, C.Y. Cho, C.C. Byeon, S.J. Park, Adv. Mater. 20, 1253 (2008)10.1002/adma.200701130 ↗
6. C.Y. Chen, Y.C. Lu, D.M. Yeh, C.C. Yang, Appl. Phys. Lett. 90, 183114 (2007)10.1063/1.2735936 ↗
7. C.W. Lai, J. An, H.C. Ong, Appl. Phys. Lett. 86, 251105 (2005)10.1063/1.1954883 ↗
8. K. Okamoto, I. Niki, A. Shvartser, Y. Narukawa, T. Mukai, A. Scherer, Nat. Mater. 3, 601 (2004)10.1038/nmat1198 ↗
9. P.P. Pompa, L. Martiradonna, A.D. Torre, F.D. Sala, L. Manna, M. De Vittorio, F. Calabi, R. Cingolani, R. Rinaldi, Nat. Nanotechnol. 1, 126 (2006)10.1038/nnano.2006.93 ↗
10. Y.J. Wang, H.P. He, Y.L. Zhang, L.W. Sun, L. Hu, K.W. Wu, J.Y. Huang, Z.Z. Ye, Appl. Phys. Lett. 100, 112103 (2012)10.1063/1.3693396 ↗
11. K.W. Wu, Y.f. Lu, H.P. He, J.Y. Huang, B.H. Zhao, Z.Z. Ye, J. Appl. Phys. 110, 023510 (2011)10.1063/1.3607270 ↗
12. H. Shen, C.X. Shan, Q. Qiao, J.S. Liu, B.H. Li, D.Z. Shen, J. Mater. Chem. C 1, 234 (2013)10.1039/C2TC00154C ↗
13. H.C. Ong, D.Y. Lei, J. Li, Proc. SPIE 6474, 64740V (2007)10.1117/12.713695 ↗
14. W.F. Yang, B. Liu, R. Chen, L.M. Wong, S.J. Wang, H.D. Sun, Appl. Phys. Lett. 97, 061911 (2010)10.1063/1.3478006 ↗
15. W.F. Yang, Y.N. Xie, R.Y. Liao, J. Sun, Z.Y. Wu, L.M. Wong, S.J. Wang, C.F. Wang, A.Y.S. Lee, H. Gong, Opt. Express 20, 14556 (2012)10.1364/OE.20.014556 ↗
16. J. Harra, J. Makitalo, R. Siikanen, M. Virkki, G. Genty, T. Kobayashi, M. Kauranen, J.M. Makela, J. Nanopart. Res. 14, 870 (2012)10.1007/s11051-012-0870-0 ↗
17. J.B. You, X.W. Zhang, Y.M. Fan, S. Qu, N.F. Chen, Appl. Phys. Lett. 91, 231907 (2007)10.1063/1.2822404 ↗
18. J. Jiang, L.P. Zhu, Y. Li, Y.M. Guo, W.S. Zhou, L. Cao, H.P. He, Z.Z. Ye, J. Alloys Compd. 547, 59 (2013)10.1016/j.jallcom.2012.08.070 ↗
19. D.W. Ma, Z.Z. Ye, H.M. Lu, J.Y. Huang, B.H. Zhao, L.P. Zhu, H.J. Zhang, P.M. He, Thin Solid Films 461, 250 (2004)10.1016/j.tsf.2004.01.085 ↗
20. K.W. Liu, Y.D. Tang, C.X. Cong, T.C. Sum, A.C.H. Huan, Z.X. Shen, L. Wang, F.Y. Jiang, X.W. Sun, H.D. Sun, Appl. Phys. Lett. 94, 151102 (2009)10.1063/1.3116617 ↗
21. J. Song, X. An, J. Zhou, Y. Liu, W. Wang, X. Li, W. Lan, E. Xie, Appl. Phys. Lett. 97, 122103 (2010)10.1063/1.3489511 ↗
22. J.M. Lin, H.Y. Lin, C.L. Cheng, Y.F. Chen, Nanotechnology 17, 4391 (2006)10.1088/0957-4484/17/17/017 ↗
23. H.P. He, Z.Z. Ye, S.S. Lin, B.H. Zhao, J.Y. Huang, J. Phys. Chem. C 112, 14262 (2008)10.1021/jp8023099 ↗
24. W.L. Barnes, Nat. Mater. 3, 588 (2004)10.1038/nmat1210 ↗
25. S. Wedge, W.L. Barnes, Opt. Express 12, 3673 (2004)10.1364/OPEX.12.003673 ↗
26. Y.H. Chan, J. Chen, S.E. Wark, S.L. Skiles, D.H. Son, J.D. Batteas, ACS Nano 3, 1735 (2009)10.1021/nn900317n ↗