From Atomistic to Device Level Investigation of Hybrid Redox Molecular/Silicon Field-Effect Memory Devices
Source abstract
Abstract
In this paper, an extensive investigation of hybrid molecular/Si field-effect memories is presented, where redox ferrocene (Fc) molecules play the role of the memory charge storage nodes. Engineering of the organic linkers between Fc and Si is achieved by grafting Fc with different linker lengths. The study shows a clear correlation between results from atomistic computational density functional theory, electrochemical measurements (cyclic voltammetry) and electrical data obtained by a detailed study on capacitors and pseudo-MOS devices. Physical-chemical analyses (atomic force microscopy, high-resolution transmission electron microscopy, and X-ray photoelectron spectroscopy), corroborate the quality of molecular layers on devices.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Force Microscopy Techniques and Applications · Molecular Junctions and Nanostructures · Analytical Chemistry and Sensors
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (18)
Show source-provided references
1. 10.1021/jp064800t10.1021/jp064800t ↗
2. 10.1021/ja042185610.1021/ja0421856 ↗
3. 10.1063/1.272033710.1063/1.2720337 ↗
4. 10.1103/PhysRevLett.56.93010.1103/PhysRevLett.56.930 ↗
5. Scanning transmission electron microscopy: An experimental tool for atomic scale interface science
6. 10.1016/j.susc.2004.11.02310.1016/j.susc.2004.11.023 ↗
7. 10.1021/ed060p69710.1021/ed060p697 ↗
8. A comparison of cyclic voltammetry and cyclic staircase voltammetry
9. Characterization and modeling of Hysteresis phenomena in high K dielectrics
10. Electrical investigation of hybrid molecular / silicon memories with redox-active ferrocene molecules acting as storage media
11. 10.1109/IEDM.2004.141926710.1109/IEDM.2004.1419267 ↗
12. 10.1063/1.280082410.1063/1.2800824 ↗
13. 10.1063/1.178225410.1063/1.1782254 ↗
14. 10.1109/16.84123610.1109/16.841236 ↗
15. 10.1002/cphc.20080081810.1002/cphc.200800818 ↗
16. 10.1109/IEDM.2007.441889310.1109/IEDM.2007.4418893 ↗
17. 0
18. 10.1002/jcc.105610.1002/jcc.1056 ↗