Pulsed laser deposition of metals in various inert gas atmospheres
Source abstract
Abstract
The changes in the properties of laser deposited metal thin films were investigated in different inert gas atmospheres (He, Ne, Ar and Xe). With increasing inert gas pressure, the reduction of particle energy is accompanied by a strong increase of the deposition rate (especially in He atmosphere), a transition from compressive to tensile stress, and changes in structure and texture. This is explained by a reduction of surface mobility of the deposited particles, a decrease of implantation, resputtering and shot-peening effects. At high gas pressures, deposition conditions similar to sputtering or even thermal deposition are obtained.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Ion-surface interactions and analysis · Metal and Thin Film Mechanics · Laser-induced spectroscopy and plasma
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References (10)
Show source-provided references
1. D.B. Chrisey, G.K. Hubler: Pulsed laser deposition of thin films (Wiley, New York 1994)
2. H.U. Krebs, J. Non-Equilibrium Processing 10, 3 (1997)
3. T. Scharf, J. Faupel, K. Sturm, H.-U. Krebs: J. Appl. Phys. 94, 4372 (2003)10.1063/1.1602565 ↗
4. E. Van de Riet, J.C.S. Kools, J. Dieleman: J. Appl. Phys. 73, 8290 (1993)10.1063/1.353447 ↗
5. S. Fähler, K. Sturm, H.U. Krebs: Appl. Phys. Lett. 75, 3766 (1999)10.1063/1.125449 ↗
6. H.U. Krebs, O. Bremert: Appl. Phys. Lett. 62, 2341 (1993)10.1063/1.109412 ↗
7. D. Sander, A. Enders, J. Kirschner: Rev. Sci. Instrum. 66, 4734 (1995)10.1063/1.1145316 ↗
8. K. Sturm, S. Fähler, H.-U. Krebs: Appl. Surf. Sci 154–155 462, (2000)10.1016/S0169-4332(99)00407-9 ↗
9. H. Windischmann: J. Appl. Phys. 62, 1800 (1987)10.1063/1.339560 ↗
10. J.A. Thornton, D.W. Hoffman: Thin solid films 177, 5 (1989)10.1016/0040-6090(89)90030-8 ↗