VUV laser ablation of insulators
Source abstract
Abstract
We present theoretical and experimental investigations of factors that may influence the surface quality of insulators patterned by 157 nm F2 laser ablation. Aspects covered include modelling of beam spatial coherence and diffraction effects for proximity mask exposure, and the role of melt relaxation on surface microstructures. Experimental results for micron-scale patterning of N-BK7 glass and NaCl crystals using proximity masks are presented and discussed within the framework of the modelling.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Laser Material Processing Techniques · Surface Roughness and Optical Measurements · Advanced Surface Polishing Techniques
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References (27)
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