Low-temperature scanning tunneling microscopy and near-edge X-ray absorption fine structure investigation of epitaxial growth of F16CuPc thin films on graphite
Source abstract
Abstract
Low-temperature scanning tunneling microscopy (LT-STM) and near-edge X-ray absorption fine structure (NEXAFS) measurements are used to study the epitaxial growth and molecular orientation of organic thin films of copper hexadecafluorophthalocyanine (F16CuPc) on highly oriented pyrolytic graphite (HOPG). Our results show that F16CuPc molecules lie flat on HOPG up to 5 nm thickness, stabilized by interfacial and interlayer π–π interactions. LT-STM experiments reveal the coexistence of two different in-plane orientations of the F16CuPc monolayer on HOPG. On the second layer of F16CuPc on HOPG, however, all F16CuPc molecules possess the same in-plane orientation.
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Research context
OpenAlex topics: Surface and Thin Film Phenomena · Molecular Junctions and Nanostructures · Surface Chemistry and Catalysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (49)
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1. L.L. Chua, J. Zaumseil, J.F. Chang, E.C.W. Ou, P.K.H. Ho, H. Sirringhaus, R.H. Friend, Nature 434, 194 (2005)10.1038/nature03376 ↗
2. S.R. Forrest, MRS Bull. 30, 28 (2005)10.1557/mrs2005.5 ↗
3. F. Yang, M. Shtein, S.R. Forrest, Nat. Mater. 4, 37 (2005)10.1038/nmat1285 ↗
4. M.A. Muccini, Nat. Mater. 5, 605 (2006)10.1038/nmat1699 ↗
5. J.A. Rogers, Science 291, 1502 (2001)10.1126/science.291.5508.1502 ↗
6. J.A. Rogers, Z. Bao, K. Baldwin, A. Dodabalapur, B. Crone, V.R. Raju, V. Kuck, H. Katz, K. Amundson, J. Ewing, P. Drzaic, Proc. Natl. Acad. Sci. USA 98, 4835 (2001)10.1073/pnas.091588098 ↗
7. C.D. Dimitrakopoulos, P.R.L. Malenfant, Adv. Mater. 14, 99 (2002)10.1002/1521-4095(20020116)14:2<99::AID-ADMA99>3.0.CO;2-9 ↗
8. H. Ishii, K. Sugiyama, E. Ito, K. Seki, Adv. Mater. 11, 605 (1999)10.1002/(SICI)1521-4095(199906)11:8<605::AID-ADMA605>3.0.CO;2-Q ↗
9. A. Kahn, N. Koch, W.Y. Gao, J. Polym. Sci., Part B: Polym. Phys. 41, 2529 (2003)10.1002/polb.10642 ↗
10. C. Cahen, A. Kahn, Adv. Mater. 15, 271 (2003)10.1002/adma.200390065 ↗
11. N. Koch, Chem. Phys. Chem. 8, 1438 (2007)10.1002/cphc.200700177 ↗
12. W. Osikowicz, M.P. de Jong, W.R. Salaneck, Adv. Mater. 19, 4213 (2007)10.1002/adma.200700622 ↗
13. J.X. Tang, C.S. Lee, S.T. Lee, J. Appl. Phys. 101, 064504 (2007)10.1063/1.2710297 ↗
14. C. Tengstedt, W. Osikowicz, W.R. Salaneck, I.D. Parker, C.-H. Hsu, M. Fahlman, Appl. Phys. Lett. 88, 053502 (2006)10.1063/1.2168515 ↗
15. N. Koch, S. Duhm, J.P. Rabe, A. Vollmer, R.L. Johnson, Phys. Rev. Lett. 95, 237601 (2005)10.1103/PhysRevLett.95.237601 ↗
16. B. de Boer, A. Hadipour, M.M. Mandoc, T. van Woudenbergh, P.W.M. Bolm, Adv. Mater. 17, 621 (2005)10.1002/adma.200401216 ↗
17. S. Khodabakhsh, B.M. Sanderson, J. Nelson, T.S. Jones, Adv. Funct. Mater. 16, 95 (2006)10.1002/adfm.200500207 ↗
18. W. Chen, C. Huang, X.Y. Gao, L. Wang, C.G. Zhen, D. Qi, S. Chen, H.L. Zhang, K.P. Loh, Z.K. Chen, A.T.S. Wee, J. Phys. Chem. B 110, 26075 (2006)10.1021/jp065821q ↗
19. W. Chen, X.Y. Gao, D.C. Qi, S. Chen, Z.K. Chen, A.T.S. Wee, Adv. Funct. Mater. 17, 1339 (2007)10.1002/adfm.200601029 ↗
20. S. Kowarik, A. Gerlach, S. Sellner, F. Schreiber, L. Cavalcanti, O. Konovalov, Phys. Rev. Lett. 96, 125504 (2006)10.1103/PhysRevLett.96.125504 ↗
21. G.E. Thayer, J.T. Sadowski, F.M. zu Heringdorf, T. Sakurai, R.M. Tromp, Phys. Rev. Lett. 95, 256106 (2005)10.1103/PhysRevLett.95.256106 ↗
22. B. Crone, A. Dodabalapur, Y.-Y. Lin, R.W. Filas, Z. Bao, A. La Duca, R. Sarpeshkar, H.E. Katz, W. Li, Nature 403, 521 (2002)10.1038/35000530 ↗
23. F. Zhao, F. Harnisch, U. Schröder, F. Scholz, P. Bogdanoff, I. Herrmann, Electrochem. Commun. 7, 1405 (2005)10.1016/j.elecom.2005.09.032 ↗
24. M.F. Craciun, S. Rogge, M.-J.L. den Boer, S. Margadonna, K. Prassides, Y. Iwasa, F. Morpurgo, Adv. Mater. 18, 320 (2005)10.1002/adma.200501268 ↗
25. N. Papageorgiou, E. Salomon, T. Angot, J.-M. Layet, L. Giovanelli, G.L. Lay, Prog. Surf. Sci. 77, 139 (2004)10.1016/j.progsurf.2005.01.001 ↗
26. Z. Bao, A.J. Lovinger, J. Brown, J. Am. Chem. Soc. 120, 207 (1998)10.1021/ja9727629 ↗
27. W. Chen, L. Wang, D.C. Qi, S. Chen, X.Y. Gao, A.T.S. Wee, Appl. Phys. Lett. 88, 184102 (2006)10.1063/1.2201615 ↗
28. W. Chen, H. Huang, S. Chen, L. Chen, H.L. Zhang, X.Y. Gao, A.S.T. Wee, Appl. Phys. Lett. 91, 114102 (2007)10.1063/1.2785948 ↗
29. W. Chen, S. Chen, H. Huang, D.C. Qi, X.Y. Gao, A.T.S. Wee, Appl. Phys. Lett. 92, 063308 (2008)10.1063/1.2857460 ↗
30. W. Chen, H. Huang, S. Chen, H.L. Zhang, X.Y. Gao, A.T.S. Wee, J. Phys. Chem. C 112, 5036 (2008)10.1021/jp710722s ↗
31. J.O. Osso, F. Schreiber, M.I. Alonso, M. Garriga, E. Barrena, H. Dosch, Org. Electron. 5, 135 (2004)10.1016/j.orgel.2004.01.006 ↗
32. D.G. de Oteyza, E. Barrena, Appl. Phys. Lett. 87, 183504 (2005)10.1063/1.2117622 ↗
33. J.O. Osso, F. Schreiber, V. Kruppa, H. Dosch, M. Garriga, M.I. Alonso, F. Cerdeira, Adv. Funct. Mater. 12, 455 (2002)10.1002/1616-3028(20020618)12:6/7<455::AID-ADFM455>3.0.CO;2-I ↗
34. A. Gerlach, F. Schreiber, S. Sellner, H. Dosch, I.A. Vartanyants, B.C.C. Cowie, Phys. Rev. B 71, 205425 (2005)10.1103/PhysRevB.71.205425 ↗
35. Y. Wakayama, J. Phys. Chem. C 111, 2675 (2007)10.1021/jp0664061 ↗
36. W. Chen, H.L. Zhang, H. Huang, L. Chen, A.T.S. Wee, Appl. Phys. Lett. 92, 193301 (2008)10.1063/1.2920199 ↗
37. W. Chen, H.L. Zhang, H. Huang, L. Chen, A.T.S. Wee, ACS Nano 2, 693 (2008)10.1021/nn800033z ↗
38. L. Chen, W. Chen, H. Huang, H.L. Zhang, J. Yuhara, A.T.S. Wee, Adv. Mater. 20, 484 (2008)10.1002/adma.200701384 ↗
39. W. Chen, H. Xu, L. Liu, X.Y. Gao, D.C. Qi, G.W. Peng, S.C. Tan, Y.P. Feng, K.P. Loh, A.T.S. Wee, Surf. Sci. 596, 176 (2005)10.1016/j.susc.2005.09.013 ↗
40. W. Chen, S. Chen, D.C. Qi, X.Y. Gao, A.S.T. Wee, J. Am. Chem. Soc. 129, 10418 (2007)10.1021/ja071658g ↗
41. X.J. Yu, O. Wilhelmi, H.O. Moser, S.V. Vidyaraj, X.Y. Gao, A.T.S. Wee, T. Nyunt, H.J. Qian, H.W. Zheng, J. Elec. Spec. Rel. Phenom. 144, 1031 (2005)
42. W. Chen, L. Wang, C. Huang, T.T. Lin, X.Y. Gao, K.P. Loh, Z.K. Chen, A.S.T. Wee, J. Am. Chem. Soc. 128, 935 (2006)10.1021/ja056324a ↗
43. M.P. Seah, W.A. Dench, Surf. Interface Anal. 1, 2 (1979)10.1002/sia.740010103 ↗
44. M.F. Craciun, S. Rogge, A.F. Morpurgo, J. Am. Chem. Soc. 127, 12210 (2005)10.1021/ja054468j ↗
45. P.H. Lippel, R.J. Wilson, M.D. Miller, Ch. Wöll, S. Chiang, Phys. Rev. Lett. 62, 171 (1989)10.1103/PhysRevLett.62.171 ↗
46. K.W. Hipps, X. Lu, X.D. Wang, U. Mazur, J. Phys. Chem. 100, 11207 (1996)10.1021/jp960422o ↗
47. C. Ludwing, R. Strohmaier, J. Petersen, B. Gompf, W. Eisenmenger, J. Vac. Sci. Technol. B 12, 1963 (1994)10.1116/1.587680 ↗
48. S.D. Wang, X. Dong, C.S. Lee, S.T. Lee, J. Phys. Chem. B 108, 1529 (2004)10.1021/jp0361733 ↗
49. J. Stöhr, NEXAFS Spectroscopy (Springer, Berlin, New York, 1992)10.1007/978-3-662-02853-7 ↗