journal article·1998-10-01

Characterization of vacancy-type defects and phosphorus donors introduced in 6H-SiC by ion implantation

T. Ohshima, A. Uedono, K. Abe, H. Itoh, Y. Aoki, M. Yoshikawa, S. Tanigawa, I. Nashiyama

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OpenAlex topics: Silicon Carbide Semiconductor Technologies · Semiconductor materials and devices · Integrated Circuits and Semiconductor Failure Analysis

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