journal article·2011-09Open access

Films of brookite TiO2 nanorods/nanoparticles deposited by matrix-assisted pulsed laser evaporation as NO2 gas-sensing layers

A. P. Caricato, R. Buonsanti, M. Catalano, M. Cesaria, P. D. Cozzoli, A. Luches, M. G. Manera, M. Martino, A. Taurino, R. Rella

Applied Physics A· Volume 104· Issue 3

Abstract

Titanium dioxide (TiO2) nanorods in the brookite phase, with average dimensions of 3–4 nm × 20–50 nm, were synthesized by a wet-chemical aminolysis route and used as precursors for thin films that were deposited by the matrix-assisted pulsed laser evaporation (MAPLE) technique. A nanorod solution in toluene (0.016 wt% TiO2) was frozen at the liquid-nitrogen temperature and irradiated with a KrF excimer laser at a fluence of 350 mJ/cm2 and repetition rate of 10 Hz. Single-crystal Si wafers, silica slides, carbon-coated Cu grids and alumina interdigitated slabs were used as substrates to allow performing different characterizations. Films fabricated with 6000 laser pulses had an average thickness of ∼150 nm, and a complete coverage of the selected substrate as achieved. High-resolution scanning and transmission electron microscopy investigations evidenced the formation of quite rough films incorporating individually distinguishable TiO2 nanorods and crystalline spherical nanoparticles with an average diameter of ∼13 nm. Spectrophotometric analysis showed high transparency through the UV-Vis spectral range. Promising resistive sensing responses to 1 ppm of NO2 mixed in dry air were obtained.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Gas Sensing Nanomaterials and Sensors · Laser-Ablation Synthesis of Nanoparticles · Analytical Chemistry and Sensors

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (35)

Show source-provided references
1. M.I. Baraton, L. Marhari, J. Nanopart. Res. 6, 107 (2004)10.1023/B:NANO.0000023239.56676.12 ↗
2. A. Vaseahsta, M. Vaclavikova, S.V. Gallios, P. Roy, O.P. Ummakarnchana, Sci. Technol. Adv. Mater. 8, 47 (2007)10.1016/j.stam.2006.11.003 ↗
3. A. Fainberg, Science 255, 1531 (1992)10.1126/science.255.5051.1531 ↗
4. L.M. Dorozhkin, V.A. Nefedov, A.G. Sabelnikov, V.G. Sevastjanov, Sens. Actuators B 99, 568 (2004)10.1016/j.snb.2004.01.007 ↗
5. J. Bardeen, W.H. Brattain, Bell Syst. Tech. J. 32, 1 (1953)10.1002/j.1538-7305.1953.tb01420.x ↗
6. T. Seiyama, A. Kato, K. Fujishi, M. Nagatani, Anal. Chem. 34, 1502 (1962)10.1021/ac60191a001 ↗
7. T.P. Heusler, A. Lorke, P. Ifeacho, H. Wiggers, C. Schulz, J. Appl. Phys. 102, 124305 (2007)
8. A. Gurlo, N. Barsan, M. Ivanovskays, U. Weimar, W. Goepel, Sens. Actuators B, Chem. 47, 92 (1998)10.1016/S0925-4005(98)00033-1 ↗
9. L.J. LeGore, R.J. Lad, S.C. Moulzolf, J.F. Vetelino, B.G. Frederick, E.A. Kenik, Thin Solid Films 406, 79 (2002)10.1016/S0040-6090(02)00047-0 ↗
10. X. Chu, D. Jiag, Y. Guo, Z.Ch. Zheng, Sens. Actuators 120, 177 (2006)10.1016/j.snb.2006.02.008 ↗
11. M.S. Lin, H.J. Leu, Electroanalysis 17, 2068 (2005)10.1002/elan.200503335 ↗
12. A. Rothschild, F. Edelman, Y. Komem, F. Cosandey, Sensors & Actuators B 67, 282 (2000)10.1016/S0925-4005(00)00523-2 ↗
13. J. Li, Y. Lu, Q. Ye, M. Cinke, J. Han, M. Meyyappan, Nano Lett. 3, 929 (2003)10.1021/nl034220x ↗
14. H.Y. Jeong, D.-S. Lee, H.K. Choi, D.H. Lee, J.-E. Kim, J.Y. Lee, W.J. Lee, S.O. Kim, S.-Y. Choi, Appl. Phys. Lett. 96, 213105 (2010)
15. P.G. Su, C.-T. Lee, C.Y. Chou, K.-H. Cheng, Y.S. Chung, Sensors & Actuators B 139, 488 (2009)10.1016/j.snb.2009.03.051 ↗
16. D.B. Chrisey, A. Piquè, R.A. McGill, J.S. Horwitz, B.R. Ringeisen, Chem. Rev. 103, 553 (2003)10.1021/cr010428w ↗
17. R. Rella, J. Spadavecchia, M.G. Manera, S. Capone, A. Taurino, M. Martino, A.P. Caricato, T. Tunno, Sensors & Actuators B 127, 426 (2007)10.1016/j.snb.2007.04.048 ↗
18. A.P. Caricato, M. Epifani, M. Martino, F. Romano, R. Rella, A. Taurino, T. Tunno, D. Valerini, J. Phys. D, Appl. Phys. 42, 095105 (2009)10.1088/0022-3727/42/9/095105 ↗
19. S. Acquaviva, M. Fernández, G. Leggieri, A. Luches, M. Martino, A. Perrone, Appl. Phys. A 69, S471 (1999)10.1007/s003390051442 ↗
20. R. Buonsanti, V. Grillo, E. Carlino, C. Giannini, T. Kipp, R. Cingolani, P.D. Cozzoli, J. Am. Chem. Soc. 130, 11223 (2008)10.1021/ja803559b ↗
21. S. S Mao, X. Chen, Chem. Rev. 107, 2891 (2007)10.1021/cr0500535 ↗
22. S.L. Isley, R.L. Penn, J. Phys. Chem. B 110, 15134 (2006)10.1021/jp061417f ↗
23. X.Q. Gong, A. Selloni, Phys. Rev. B 76, 235307 (2007)
24. M.W. Cross, W.J. Varhue, Nanotechnology 19, 435705 (2008)
25. X. Su, Z. Zhang, M. Zhu, Appl. Phys. Lett. 88, 061913 (2006)
26. T. Karabacak, J.S. DeLuca, P.-I. Wang, J. Appl. Phys. 99, 064304 (2006)10.1063/1.2180437 ↗
27. Y. Wang, C. Dellago, J. Phys. Chem. B 107, 9214 (2003)10.1021/jp034445w ↗
28. S. Link, C. Burda, B. Nikoobakht, M.A. El-Sayed, J. Phys. Chem. B 104, 6152 (2004)10.1021/jp000679t ↗
29. H. Zhang, J.F. Banfield, J. Phys. Chem. B l04, 3481 (2000)10.1021/jp000499j ↗
30. P.K. Naicker, P.T. Cummings, H. Zhang, J.F. Banfield, J. Phys. Chem. B 109, 15243 (2005)10.1021/jp050963q ↗
31. J.-G. Li, T. Ishigaki, Acta Mater. 52, 5143 (2008)
32. M. Koelsch, S. Cassaignon, J.F. Guillemoles, J.P. Jolivet, Thin Solid Films 403, 312 (2002)10.1016/S0040-6090(01)01509-7 ↗
33. S.-D. Mo, W.Y. Ching, Phys. Rev. B 51, 13023 (1995)10.1103/PhysRevB.51.13023 ↗
34. J. Zhang, X. Xiao, J. Nan, J. Hazard. Mater. 176, 617 (2010)10.1016/j.jhazmat.2009.11.074 ↗
35. R. Zallen, M.P. Moret, Solid State Commun. 137, 154–157 (2006)10.1016/j.ssc.2005.10.024 ↗