Pulsed arc deposition of super-hard amorphous carbon films
Source abstract
Abstract
Hydrogen-free amorphous carbon films with hardness up to 75 GPa have been deposited by special pulsed arc techniques. The influence of plasma and deposition conditions on the film properties is discussed and some applications are shown.
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Source: openaire · Quality: needs review · Source record ↗
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Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · Advanced materials and composites
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