ZnO nanorod micropatterning via laser-induced forward transfer
Source abstract
Abstract
We report a method for micropatterning (25–900 μm2 pixel size) of ZnO nanorods onto a silicon substrate via a low-temperature (overall under 100 °C) two-step process, involving a laser-based direct-write technique (laser-induced forward transfer) and sequential chemical growth. The rods produced via this route are aligned in the [0001] crystal direction. Photoluminescence shows, next to the band-gap emission, strong green-yellow emission centred at ∼570 nm. Additionally, the rod arrays show excellent field-emission properties with a threshold field for emission of 5 V/μm.
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Research context
OpenAlex topics: ZnO doping and properties · Quantum Dots Synthesis And Properties · Electronic and Structural Properties of Oxides
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References (23)
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