Enhanced ablation of silica by the superposition of femtosecond and nanosecond laser pulses
Source abstract
Abstract
We investigate the ablation process in SiO2 by the superposition of 180 fs laser pulse (λcenter=800 nm) with a 15 ns laser pulse (λcenter=532 nm). Compared to femtosecond laser pulses alone, we measured an increase of 270±30% in volume of the ejected material with only a total increase of 40% of lasers fluences. This increase of ablation is the result of thermal and incubation effects generated by the femtosecond laser pulse.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Laser Material Processing Techniques · Laser-induced spectroscopy and plasma · Advanced Surface Polishing Techniques
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