New oxygen donors in silicon
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OpenAlex topics: Silicon and Solar Cell Technologies · Semiconductor materials and devices · Thin-Film Transistor Technologies
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References (37)
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1. W. Zulehner, D. Huber: InCrystals Vol. 8 (Springer, Berlin, Heidelberg 1982) p. 1
2. J.H. Matlock: Silicon Processing, ASTM STP 804, ed. by D.C. Gupta (American Society for Testing and Materials 1983) p. 33210.1520/STP36177S ↗
3. L. Jastrzebski, R. Soydan, J. McGinn, R. Kleppinger, M. Blumenfeld, G. Gillespie, N. Arnold, B. Goldsmith, W. Henry, S. Vecumbra: J. Electrochem. Soc.134, 1018 (1987)10.1149/1.2100559 ↗
4. K. Hölzlein, G. Pensl, M. Schulz, P. Stolz: Rev. Sci. Instrum.57, 1373 (1986)10.1063/1.1138603 ↗
5. J. Patel, W. Jackson, H. Reiss: J. Appl. Phys.48, 5279 (1977)10.1063/1.323558 ↗
6. P. Freeland, K. Jackson, C. Lowe, J. Patel: Appl. Phys. Lett.30, 31 (1977)10.1063/1.89200 ↗
7. W. Patrick, E. Hearn, W. Westrop, A. Bohg: J. Appl. Phys.50, 7156 (1979)10.1063/1.325825 ↗
8. J.R. Patel:Semiconductor Silicon 1981, ed. by H.R. Huff, R.J. Kriegler, Y. Takeishi, Electrochem. Soc. Pennington, N.J. 1981, p. 189
9. K. Tempelhoff, B. Hahn, R. Gleichmann: In Ref. [8], p. 244
10. K. Wada, H. Nakanishi, T. Takaoko, N. Inoue: J. Cryst. Growth57, 535 (1982)10.1016/0022-0248(82)90070-7 ↗
11. J. Desseaux-Thibault, A. Bourret, J.M. Penisson: Inst. Phys. Conf. Ser.67, 71 (1983)
12. H. Bender: Phys. Status Solidi (a)86, 245 (1984)10.1002/pssa.2210860126 ↗
13. A. Bourret, J. Thibault-Desseaux, D.N. Seidman: J. Appl. Phys.55, 825 (1984)10.1063/1.333178 ↗
14. A. Bourret: Inst. Phys. Conf. Ser.87, 39 (1987)
15. W.A. Tiller: J. Appl. Phys.59, 3255 (1986)10.1063/1.336908 ↗
16. G.F. Cerofolini, L. Meda, M.L. Polignano, G. Ottaviani, H. Bender, C. Claeys, A. Armigliato, S. Somi:Semiconductor Silicon 1986, Proc. 5th Int. Symp. on Silicon Materials Science and Technology, ed. by H.R. Huff, T. Abe, B. Kolbesen (The Electrochem. Soc., Pennington N.J. 1986) p. 706
17. W. Bergholz, J.L. Hutchison, P. Pirouz: J. Appl. Phys.58, 3419 (1985)10.1063/1.335760 ↗
18. W. Bergholz, J.L. Hutchison, P. Pirouz: Proc. Oxford Conf. on Micr. of Semicond. Mater., 1985
19. W. Bergholz, J.L. Hutchison, G.R. Booker: In Ref. [16] p. 874
20. P. Capper, A.W. Jones, E.J. Wallhouse, J.G. Wilkes: J. Appl. Phys.48, 1646 (1977)10.1063/1.323847 ↗
21. A. Kanamori, M. Kanamori: J. Appl. Phys.50, 8095 (1979)10.1063/1.325936 ↗
22. V. Cazcarra, P. Zunino: J. Appl. Phys.51, 4206 (1980)10.1063/1.328278 ↗
23. K. Schmalz, P. Gaworzewski: Phys. Stat. Solidi (a)64, 151 (1981)10.1002/pssa.2210640116 ↗
24. P. Gaworzewski, K. Schmalz: Phys. Stat. Solidi (a)77, 571 (1983)10.1002/pssa.2210770221 ↗
25. N. Fukuoka: Jpn. J. Appl. Phys.24, 1450 (1985)10.1143/JJAP.24.1450 ↗
26. K. Yasutake, M. Umeno, H. Kawabe, H. Nakayama, T. Nishino, Y. Hamakawa: Jpn. J. Appl. Phys.21, 28 (1982)10.1143/JJAP.21.28 ↗
27. M. Tajima, U. Gösele, J. Weber, R. Sauer: Appl. Phys. Lett.43, 270 (1983)10.1063/1.94323 ↗
28. P. Wagner, C. Holm, E. Sirtl, R. Oeder, W. Zulehner: InAdvances in Solid State Physics, XXIV, ed. by P. Grosse, (Vieweg, Braunschweig 1984) p. 19110.1007/BFb0107451 ↗
29. K. Hölzlein, G. Pensl, M. Schulz: Appl. Phys. A34, 155 (1984)10.1007/BF00616911 ↗
30. K. Hölzlein: Ph. D. thesis, University of Erlangen 1985
31. K. Hölzlein, G. Pensl, M. Schulz, N.M. Johnson: Appl. Phys. Lett.48, 916 (1986)10.1063/1.96657 ↗
32. K. Hölzlein, G. Pensl, M. Schulz, N.M. Johnson: Mat. Res. Soc. Symp. Proc.59, 481 (1986)10.1557/PROC-59-481 ↗
33. A. Henry, J.L. Pautrat, K. Saminadayar: InMaterial Science Forum,10?12, ed. by H.J. von Bardeleben (Trans. Tech. Publications Ltd., Switzerland 1986) p. 985
34. M. Schulz: Surf. Sci.132, 422 (1983)10.1016/0039-6028(83)90551-4 ↗
35. J. Frenkel: Phys. Rev.54, 647 (1938)10.1103/PhysRev.54.647 ↗
36. H. Lefevre: Appl. Phys. A22, 15 (1980)10.1007/BF00897926 ↗
37. R. Wörner, O.F. Schirmer: Phys. Rev. B34, 1381 (1986)10.1103/PhysRevB.34.1381 ↗