journal article·1990-02

Modelling of wafer heating during rapid thermal processing

R. Kakoschke, E. Bu�mann, H. F�ll

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Silicon and Solar Cell Technologies · 3D IC and TSV technologies · Thin-Film Transistor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (13)

Show source-provided references
1. Rapid Thermal Processing of Electronic Materials, ed. by S.R. Wilson, R. Powell, D.E. Davies (MRS Symp. Proc., Pittsburgh 1987)
2. R. Singh: J. Appl. Phys. 63, R59?114 (1988)10.1063/1.340176 ↗
3. K. Nishiyama, M. Arai, N. Watanabe: Jpn. J. Appl. Phys. 19, L563-L566 (1980)10.1143/JJAP.19.L563 ↗
4. G. Bentini, L. Correra, C. Donolato: J. Appl. Phys. 56, 2922 (1984)10.1063/1.333832 ↗
5. H.A. Lord: IEEE Trans. SM-1, 105 (1988)
6. J. Blake, J.C. Gelpey, J.F. Moquin, J. Schlueter, R. Capodilupo: In Rapid Thermal Processing of Electronic Materials, ed. by S.R. Wilson, R. Powell, D.E. Davies (MRS Symp. Proc., Pittsburgh 1987) p. 26510.1557/PROC-92-265 ↗
7. R.T. Blunt, M.S.M. Lamb, R. Szweda: Appl. Phys. Lett. 47, 304 (1985)10.1063/1.96200 ↗
8. J. Kuzuhara: In Rapid Thermal Processing of Electronic Materials, ed. by S.R. Wilson, R. Powell, D.E. Davies (MRS Symp. Proc., Pittsburgh 1987) p. 401
9. T.-J. Shieh, R.L. Carter: IEEE Trans. ED-36, 19 (1989)10.1109/16.21172 ↗
10. C. Hill, S. Jones: In Reduced Thermal Processing for ULSI, ed. by R.A. Levy (Plenum, New York 1989) in press
11. T.E. Seidel, S.J. Lischner, C.S. Pai, S.S. Lau: J. Appl. Phys. 57, 1317 (1985)10.1063/1.334532 ↗
12. S. Kakac, Y. Yener: Heat Conduction, 2nd edn. (Hemisphere, Washington 1985)
13. R. Kakoschke, E. Bußmann, H. Föll: To be published