Diffusion of silicon in titanium nitride films. Efficiency of TiN barrier layers

journal article·1992-11

K. G. Grigorov, G. I. Grigorov, M. Stoyanova, J. L. Vignes, J. P. Langeron, P. Denjean, J. Perriere

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OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · GaN-based semiconductor devices and materials

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