journal article·2015-04

Advantages of deep-UV AlGaN light-emitting diodes with an AlGaN/AlGaN superlattices electron blocking layer

Yi An Yin, Naiyin Wang, Shuti Li, Yong Zhang, Guanghan Fan

Applied Physics A· Volume 119· Issue 1
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Abstract

In this work, the AlGaN/AlGaN superlattices (SLs) electron blocking layer (EBL) is designed to replace conventional AlGaN EBL in the AlGaN-based deep-UV light-emitting diodes (DUV-LEDs). The simulation results show that the DUV-LEDs with SLs possess higher emission power and internal quantum efficiency as compared to those with conventional EBL, which is attributed to the suppression of electron leakage and the enhancement of hole injection efficiency due to the alleviated strain force and the appropriately modified energy band caused by SLs EBL. The results also demonstrate that the efficiency droop is markedly reduced when the SLs EBL is adopted.
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · ZnO doping and properties

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References (23)

Show source-provided references
1. M.S. Shur, R. Gaska, IEEE Trans. Electron. Devices 57, 12 (2010)10.1109/TED.2009.2033768 ↗
2. T. Passow, R. Gutt, M. Kunzer, W. Pletschen, L. Kirste, K. Forghani, F. Scholz, K. Köhler, J. Wagner, Jpn. J. Appl. Phys. 52, 08JG16 (2013)10.7567/JJAP.52.08JG16 ↗
3. M. Shatalov, W. Sun, A. Lunev, X. Hu, A. Dobrinsky, Y. Bilenko, J. Yank, M. Shur, R. Gaska, C. Moe, G. Garrett, M. Wraback, Appl. Phys. Express 5, 082101 (2012)10.1143/APEX.5.082101 ↗
4. M.L. Nakarmi, K.H. Kim, M. Khizar, Z.Y. Fan, J.Y. Lin, H.X. Jiang, Appl. Phys. Lett. 86, 092108 (2005)10.1063/1.1879098 ↗
5. H. Hirayama, Y. Tsukada, T. Maeda, N. Kamata, Appl. Phys. Express 3, 031002 (2010)10.1143/APEX.3.031002 ↗
6. K.B. Lee, P.J. Parbrook, T. Wang, J. Bai, F. Ranalli, R.J. Airey, G. Hill, J. Cryst. Growth 311, 2857 (2009)10.1016/j.jcrysgro.2009.01.030 ↗
7. H. Hirayama, N. Noguchi, T. Yatable, N. Kamata, Appl. Phys. Express 1, 051101 (2008)10.1143/APEX.1.051101 ↗
8. T. Kolbe, F. Mehnke, M. Guttmann, C. Kuhn, J. Rass, T. Wernicke, M. Kneissl, Appl. Phys. Lett. 103, 031109 (2013)10.1063/1.4813859 ↗
9. M.F. Huang, T.H. Lu, IEEE J. Quantum Electron. 42, 820 (2006)10.1109/JQE.2006.877217 ↗
10. M.C. Tsai, S.H. Yen, Y.K. Kuo, Appl. Phys. Lett. 98, 111114 (2011)10.1063/1.3567786 ↗
11. J. Zhang, W. Tian, F. Wu, W. Yan, H. Xiong, J. Dai, Y. Fang, Z. Wu, C. Chen, IEEE Photonics J. 5, 1600310 (2013)10.1109/JPHOT.2013.2278520 ↗
12. J. Piprek, Z.M. Simon Li, Appl. Phys. Lett. 102, 131103 (2013)10.1063/1.4799672 ↗
13. E.F. Schubert, W. Grieshaber, I.D. Goepfert, Appl. Phys. Lett. 69, 3737 (1996)10.1063/1.117206 ↗
14. P. Kozodoy, M. Hansen, S.P. DenBaars, U.K. Mishra, Appl. Phys. Lett. 74, 3681 (1999)10.1063/1.123220 ↗
15. B. Cheng, S. Choi, J.E. Northrup, Z. Yang, C. Knollenberg, M. Teepe, T. Wunderer, C.L. Chua, N.M. Johnson, Appl. Phys. Lett. 102, 231106 (2013)10.1063/1.4809947 ↗
16. Y.Y. Zhang, Y.A. Yin, Appl. Phys. Lett. 99, 221103 (2011)10.1063/1.3653390 ↗
17. K.S. Kim, J.H. Kim, S.J. Jung, Y.J. Park, S.N. Cho, Appl. Phys. Lett. 96, 091104 (2010)10.1063/1.3340939 ↗
18. Y.Y. Zhang, X.L. Zhu, Y.A. Yin, J. Ma, IEEE Electron. Device Lett. 33, 994 (2012)10.1109/LED.2012.2197593 ↗
19. R.B. Chung, C. Han, C.C. Pan, N. Pfaff, J.S. Speck, S.P. DenBaars, S. Nakamura, Appl. Phys. Lett. 101, 131113 (2012)10.1063/1.4756791 ↗
20. T. Nishida, H. Saito, N. Kobayashi, Appl. Phys. Lett. 78, 399 (2001)10.1063/1.1338964 ↗
21. J. Piprek, T. Katona, S.P. DenBaars, S. Li, in Light-Emitting Diodes: Research, Manufacturing, and Applications VIII. SPIE Proc., vol. 5366, (2004), p. 127
22. I. Vurgaftman, J.R. Meyer, J. Appl. Phys. 94, 3675 (2003)10.1063/1.1600519 ↗
23. J. Piprek, Phys. Status Solidi A 207, 2217 (2010)10.1002/pssa.201026149 ↗