Generation of single-crystalline domain in nano-scale silicon pillars by near-field short pulsed laser
Source abstract
Abstract
We observe laser-induced grain morphology change in silicon nanopillars under a transmission electron microscopy (TEM) environment. We couple the TEM with a near-field scanning optical microscopy pulsed laser processing system. This novel combination enables immediate scrutiny on the grain morphologies that the pulsed laser irradiation produces. We find unusual transformation of the tip of the amorphous or polycrystalline silicon pillar into a single crystalline domain via melt-mediated crystallization. On the basis of the three-dimensional finite difference simulation result and the dark field TEM data, we propose that the creation of the distinct single crystalline tip originates from the dominant grain growth initiated at the apex of the non-planar liquid–solid interface. Our microscopic observation provides a fundamental basis for laser-induced conversion of amorphous nanostructures into coarse-grained crystals.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Near-Field Optical Microscopy · Silicon Nanostructures and Photoluminescence · Laser Material Processing Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (39)
Show source-provided references
1. G. Andra, J. Bergmann, F. Falk, E. Ose, Thin Solid Films 337, 98–100 (1999)10.1016/S0040-6090(98)01191-2 ↗
2. J.S. Im, R.S. Sposili, M.A. Crowder, Appl. Phys. Lett. 70, 3434–3436 (1997)10.1063/1.119194 ↗
3. S.D. Brotherton, Semicond. Sci. Technol. 10, 721–738 (1995)10.1088/0268-1242/10/6/001 ↗
4. J.S. Im, H.J. Kim, Appl. Phys. Lett. 64, 2303–2305 (1994)10.1063/1.111651 ↗
5. P.C. van der Wilt, B.D. van Dijk, G.J. Bertens, R. Ishihara, C.I.M. Beenakker, Appl. Phys. Lett. 79, 1819–1821 (2001)10.1063/1.1402641 ↗
6. J. Zhang, M. Trifunovic, M. van der Zwan, H. Takagishi, R. Kawajiri, T. Shimoda, C.I.M. Beenakker, R. Ishihara, Appl. Phys. Lett. 102, 243502 (2013)10.1063/1.4811356 ↗
7. S. Hu, P.W. Leu, A.F. Marshall, P.C. McIntyre, Nat. Nanotechnol. 4, 649–653 (2009)10.1038/nnano.2009.233 ↗
8. S.H. Wee, C. Cantoni, T.R. Fanning, C.W. Teplin, D.F. Bogorin, J. Bornstein, K. Bowers, P. Schroeter, F. Hasoon, H.M. Branz, M.P. Paranthaman, A. Goyal, Energy Environ. Sci. 5, 6052–6056 (2012)10.1039/c2ee03350j ↗
9. D.R. Kim, C.H. Lee, J.M. Weisse, I.S. Cho, X. Zheng, Nano Lett. 12, 6485–6491 (2012)10.1021/nl3041492 ↗
10. Y. Chen, Z. Xu, M.R. Gartia, D. Whitlock, Y. Lian, G.L. Liu, ACS Nano 5, 8002–8012 (2011)10.1021/nn2024754 ↗
11. R.H. Hopkins, A. Rohatgi, J. Cryst. Growth 75, 67–79 (1986)10.1016/0022-0248(86)90226-5 ↗
12. B.M. Kayes, M.A. Filler, M.C. Putnam, M.D. Kelzenberg, N.S. Lewis, H.A. Atwater, Appl. Phys. Lett. 91, 103110 (2007)10.1063/1.2779236 ↗
13. B. Xiang, D.J. Hwang, J.B. In, S.G. Ryu, J.H. Yoo, O. Dubon, A.M. Minor, C.P. Grigoropoulos, Nano Lett. 12, 2524–2529 (2012)10.1021/nl3007352 ↗
14. D.J. Hwang, A. Chimmalgi, C.P. Grigoropoulos, J. Appl. Phys. 99, 044905 (2006)10.1063/1.2172723 ↗
15. R. Müller, C. Lienau, J. Microsc. 202, 339–346 (2000)10.1046/j.1365-2818.2001.00825.x ↗
16. B.M. Lee, T. Kuranaga, S. Munetoh, T. Motooka, J. Appl. Phys. 101, 054316 (2007)10.1063/1.2646109 ↗
17. S. Munetoh, T. Kuranaga, B.M. Lee, T. Motooka, T. Endo, T. Warabisako, Jpn. J. Appl. Phys. 45, 4344–4346 (2006)10.1143/JJAP.45.4344 ↗
18. J.P. Leonard, J.S. Im, Appl. Phys. Lett. 78, 3454–3456 (2001)10.1063/1.1355004 ↗
19. A. Fell, G. Willeke, Appl Phys A Mater 98, 435–440 (2010)10.1007/s00339-009-5416-7 ↗
20. H. Kisdarjono, A.T. Voutsas, R. Solanki, J. Appl. Phys. 94, 4374–4381 (2003)10.1063/1.1609034 ↗
21. S. Deunamuno, E. Fogarassy, Appl. Surf. Sci. 36, 1–11 (1989)10.1016/0169-4332(89)90894-5 ↗
22. S.P. Zhvavyi, Tech. Phys. 45, 1014–1018 (2000)10.1134/1.1307010 ↗
23. K. Higuchi, K. Kimura, A. Mizuno, M. Watanabe, Y. Katayama, K. Kuribayashi, J. Non Cryst. Solids 353, 2997–2999 (2007)10.1016/j.jnoncrysol.2007.05.029 ↗
24. H.C. Webber, A.G. Cullis, N.G. Chew, Appl. Phys. Lett. 43, 669–671 (1983)10.1063/1.94440 ↗
25. H. Kobatake, H. Fukuyama, T. Tsukada, S. Awaji, Meas. Sci. Technol. 21, 025901 (2010)10.1088/0957-0233/21/2/025901 ↗
26. C.P. Grigoropoulos, R.H. Buckholz, G.A. Domoto, J. Appl. Phys. 60, 2304–2309 (1986)10.1063/1.337139 ↗
27. F. Cacho, H. Bono, R. Beneyton, B. Dumont, A. Colin, P. Morin, J. Appl. Phys. 108, 014902 (2010)10.1063/1.3452385 ↗
28. G.E. Jellison, F.A. Modine, J. Appl. Phys. 76, 3758–3761 (1994)10.1063/1.357378 ↗
29. P.A. Stolk, A. Polman, W.C. Sinke, Phys. Rev. B 47, 5–13 (1993)10.1103/PhysRevB.47.5 ↗
30. J.P. Leonard, J.S. Im, Mater. Res. Soc. Symp. Proc. 580, 233–244 (2000)10.1557/PROC-580-233 ↗
31. M. Saito, M. Matsumoto, in Monte Carlo and Quasi-Monte Carlo Methods 2008, ed. by P. L’Ecuyer, A.B. Owen (Springer, Berlin, 2009), pp. 589–60210.1007/978-3-642-04107-5_38 ↗
32. M.O. Thompson, G.J. Galvin, J.W. Mayer, P.S. Peercy, J.M. Poate, D.C. Jacobson, A.G. Cullis, N.G. Chew, Phys. Rev. Lett. 52, 2360–2363 (1984)10.1103/PhysRevLett.52.2360 ↗
33. B. Leung, J. Song, Y. Zhang, J. Han, Adv. Mater. 25, 1285–1289 (2013)10.1002/adma.201204047 ↗
34. R.S. Sposili, J.S. Im, Appl. Phys. Lett. 69, 2864–2866 (1996)10.1063/1.117344 ↗
35. M. Hatano, S. Moon, M. Lee, K. Suzuki, C.P. Grigoropoulos, J. Appl. Phys. 87, 36–43 (2000)10.1063/1.371823 ↗
36. M. Weizman, C. Klimm, N.H. Nickel, B. Rech, Appl. Phys. Lett. 100, 161906 (2012)10.1063/1.4704559 ↗
37. G.E. Jellison, D.H. Lowndes, Appl. Phys. Lett. 51, 352–354 (1987)10.1063/1.98438 ↗
38. J.Y. Tsao, P.S. Peercy, Phys. Rev. Lett. 58, 2782–2785 (1987)10.1103/PhysRevLett.58.2782 ↗
39. S. Hayashi, Y. Fujita, T. Kamikura, K. Sakaike, M. Akazawa, M. Ikeda, H. Hanafusa, S. Higashi, Appl. Phys. Lett. 101, 172111 (2012)10.1063/1.4764522 ↗