journal article·2009-09

Optical and IR studies on r.f. magnetron sputtered ultra-thin MoO3 films

K. SrinivasaRao, B. Rajini Kanth, P. K. Mukhopadhyay

Applied Physics A· Volume 96· Issue 4
Publisher page

Abstract

Ultra-thin MoO3 films were deposited onto glass and Si substrates by r.f. magnetron sputtering. The optical and IR properties of the films were studied in the range of 250 to 1000 nm and 400 to 1500 cm−1, respectively. The optical transmission spectra show a significant shift in absorption edge. The energy gap of the films deposited at 373 K and 0.1 mbar was found to be 3.93 eV, and it decreases with increasing substrate temperature and decreasing sputtering pressure. The IR transmittance spectra shows strong modes of vibrations of Mo=O and Mo–O–Mo units of MoO3 molecule. A significant change in energy gap and a shift in frequency of IR modes were observed in ultra-thin MoO3 films.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Transition Metal Oxide Nanomaterials · Gas Sensing Nanomaterials and Sensors · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (22)

Show source-provided references
1. B. Ywuono, T. Schloesser, A. Gschwardtner, G. Innertsberger, A. Grtassi, A. Olbrich, W.H. Krutschneider, Microelectron. Eng. 48, 51 (1999)10.1016/S0167-9317(99)00336-6 ↗
2. A.K. Arof, E.B. Sariman, M.Z. Mastor, J. Phys. III Fr. 4, 849 (1994)
3. C. Julien, B. Yebka, J.P. Guesdon, Ionics 1, 316 (1995)10.1007/BF02390214 ↗
4. C.G. Granqvist, Handbook of Inorganic Electrochromic Materials (Elesevier, Berlin, 1995)
5. N. Kumagai, K. Tanno, J. Appl. Electrochem. 18, 857 (1988)10.1007/BF01016042 ↗
6. D. Mutschall, K. Holzner, E. Obermeier, Sens. Actuators B 35–36, 320 (1996)10.1016/S0925-4005(97)80089-5 ↗
7. J. Scarminio, A. Lourenceo, A. Gorenstein, Thin Solid Films 302, 66 (1997)10.1016/S0040-6090(96)09539-9 ↗
8. M.A. Quevedo Lopez, R. Ramirez-Bon, R.A. Orozco-Teran, O. Mendozer-Gonzalez, O. Zeleya-Angel, Thin Solid Films 343, 202 (1999)10.1016/S0040-6090(98)01680-0 ↗
9. W.D. Westwood, S. Maniv, P.J. Scanlon, J. Appl. Phys. 54, 6841 (1983)10.1063/1.332006 ↗
10. K. Ellmer, R. Wendt, Surf. Coat. Technol. 93, 21 (1997)10.1016/S0257-8972(97)00031-5 ↗
11. J.A. Thorton, A.S. Penfold, in Thin Film Processes, ed. by J.L. Vossen, W. Kern (Academic, New York, 1978), p. 78
12. P.F. Carcia, E.M. McCarron III, Thin Solid Films 155, 55 (1987)10.1016/0040-6090(87)90452-4 ↗
13. G.S. Nadkarni, J.G. Simmons, J. Appl. Phys. 41, 545 (1970)10.1063/1.1658710 ↗
14. O.M. Hussain, K.S. Rao, K.V. Madhuri, C.V. Ramana, B.S. Naidu, S. Pai, J. John, R. Pinto, Appl. Phys. A 417–422 (2002)10.1007/s003390100994 ↗
15. N. Kenny, C.R. Kannewurif, D.H. Whitmore, J. Phys. Chem. Solids 27, 1237 (1966)10.1016/0022-3697(66)90007-2 ↗
16. C. Reyes-Betanzo, J.L. Herren-Perez, G.H. Cocoletzi, O. Kzelaya-Angle, J. Appl. Phys. 88, 223 (2000)10.1063/1.373646 ↗
17. V.K. Sabhapathi, O.M. Hussain, P.S. Reddy, K.T.R.K. Reddy, S. Uthanna, B.S. Naidu, P.J. Reddy, Phys. Stat. Sol. (a) 148, 167 (1975)10.1002/pssa.2211480114 ↗
18. M. Anwar, C.A. Hogarth, Int. J. Electron. 67, 567 (1987)10.1080/00207218908921110 ↗
19. N. Sotani, K. Eda, M. Sadamatu, S. Takagi, Bull. Chem. Soc. Jpn. 62, 903 (1989)10.1246/bcsj.62.903 ↗
20. C.G. Berrclough, J. Lewis, R.S. Nyhalm, J. Chem. Soc. 3552 (1959)10.1039/JR9590003552 ↗
21. I.R. Beattie, N. Cheetham, M. Gardner, D.E. Rogers, J. Chem. Soc. A 2240 (1971)10.1039/j19710002240 ↗
22. M. Kurumada, Ch. Kaito, J. Phys. Soc. Jpn. 75, 074712 (2006)10.1143/JPSJ.75.074712 ↗