Processing advances in transparent Foturan® MEMS
Source abstract
Abstract
A lithographic patterning process for Foturan® is demonstrated that optimizes the aspect ratio and side-wall roughness and eliminates all traces of white redeposit on the side walls. The structures may then be run through a post-etch anneal to further reduce side-wall roughness to approximately 4 nm. Thermal fusion bonding during the post-etch anneal allows for the production of three-dimensional structures. Finally, we report the optical properties of patterned Foturan® microstructures observed using a 780-nm distributed feedback laser.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Optical Coatings and Gratings · Photonic and Optical Devices · Nanofabrication and Lithography Techniques
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References (14)
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